Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000

Product Details
Customization: Available
Type: Metal Target
Shape: Plate

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  • Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
  • Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
  • Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
  • Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
  • Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
  • Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-Cu
Purity
99.9%-99.9999%
Size
D50.8X3mm or as Your Request
OEM
Support
MOQ
1PCS
Materials
Pure Metal Copper
Application
PVD Film Coating
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Copper Target
Trademark
XinKang
Origin
China
HS Code
7402000090
Production Capacity
10000PCS/Month

Product Description

Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
Product Description

XinKang Factory Supply: Top Ranking 4N 99.99% High Purity Cuprum/Cu/Copper Planar Target for PVD Coating - Ideal for Evaporation Materials Copper Target
Name Metal Copper Sputtering Target (Cu Target)
Material Copper Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,
Size D50.8x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 8.954g/cm3
Melting Point 1083°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Our Copper sputtering target retains all the remarkable properties of pure copper (Cu). Copper, symbolized as Cu (from the Latin: cuprum) and bearing the atomic number 29, is renowned for its softness, malleability, and ductility. It boasts exceptional thermal and electrical conductivity. A freshly exposed surface of pure copper radiates a pinkish-orange hue. Copper serves multifarious purposes: as a thermal and electrical conductor, a key building material, and a pivotal component in various metal alloys. Produced through advanced melting technology, our Copper Sputtering Targets are indispensable in semiconductor applications, decorative coatings, and advanced packaging fields.

We specialize in producing copper sputtering targets with an extraordinary purity range of 99.9% to 99.9999%, boasting oxygen content as low as <1ppm. These targets find critical applications in display screens, touch screen wiring, protective films, solar light-absorbing layers, and semiconductor wiring. Our portfolio includes planar copper sputtering targets (up to G8.5 generation) and copper rotary targets, predominantly used in the touch screen industry. Overcoming the challenge of grain breakage, we employ large deformation processing and meticulous twin growth control to achieve a fine and uniform microstructure. This ensures lower erosion rates and minimizes particle formation sensitivity during sputtering, delivering unmatched performance and reliability.
Product Parameters

Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
Application:
Preparation Process of Copper Sputtering Target
Material Preparation - Electrolytic Purification & Electron Beam Melting - Chemical Analysis - Forging - Rolling - Annealing - Metallographic Inspection - Machining - Dimensional Inspection - Cleaning - Final Inspection - Packaging

Copper Sputtering Target and Its Preparation Method
The copper undergoes purification from 99.95% to 99.99%, 99.999%, and up to the highest purity of 99.9999% (6N) through multiple electrolysis and regional smelting processes. As the purest copper available in China, these copper ingots serve as the raw material. Through forging, rolling, and heat treatment, the crystal grains in the copper ingots are refined and density is increased to meet the stringent requirements of copper targets for sputtering. Post-deformation, the high-purity copper material is meticulously machined to achieve the precision and surface quality necessary for the desired target size in vacuum coating machines.

Other Alloy Forms of Copper Sputtering Target
Our portfolio includes Tin-Copper, ***-Copper, Tungsten-Copper, Silver-Copper, Copper-Phosphorus, Nickel-Copper alloy targets, and many more.

Related Products:
Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a leading innovator in the research, development, production, processing, sales, and service of premium metal materials. Our extensive product range includes Metal Elements, Alloys, Metal Sputtering Targets, Alloy Targets, Ceramic Targets, Evaporation Materials, Metal Powders, Alloy Powders, and other bespoke metal products. We adhere to stringent standards such as GB/T, ASTM/B, ASME SB, AMS, DIN, and JIS, ensuring our offerings meet the precise requirements of our clients. Our products are pivotal across a multitude of industries, including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instruments, metallurgy, and automotive sectors. Located in the heart of Changsha, Hunan, our state-of-the-art factory spans 4000 square meters and is certified with ISO9001:2015 for quality management and ISO14001:2015 for environmental management. Our facility is equipped with advanced technology and a skilled workforce, including professional technicians and trained workers. To guarantee superior quality, we utilize cutting-edge testing instruments such as carbon-sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our commitment to excellence has earned us a global clientele, with our products being exported to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Customers highly value our exceptional product quality, competitive pricing, timely delivery, and outstanding after-sales service.
Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
Certifications

Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
Factory and Equippments

Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
Packaging & Shipping

Custom Size Copper Targets 99.9%-99.9999% Purity C10100 C11000 C12000
FAQ

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