High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200

Product Details
Customization: Available
Type: Metal Target
Shape: Plate

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ISO 9001, ISO 14001
  • High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
  • High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
  • High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
  • High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
  • High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
  • High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-Cu
Purity
99.9%-99.9999%
Size
D50.8X3mm or as Your Request
OEM
Support
MOQ
1PCS
Materials
Pure Metal Copper
Application
PVD Film Coating
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Copper Target
Trademark
XinKang
Origin
China
HS Code
7402000090
Production Capacity
10000PCS/Month

Product Description

High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
Product Description

XinKang Factory Supply Top Ranking 4N 99.99% High Purity Cuprum/Cu/Copper Planar Target for PVD Coating for Evaporation Materials Copper Target
Name Metal Copper Sputtering Target (Cu Target)
Material Copper Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,
Size D50.8x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 8.954g/cm3
Melting Point 1083°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Our Copper sputtering target retains all the exceptional properties of pure metal copper (Cu). Copper, denoted by the symbol Cu (derived from Latin: cuprum) and atomic number 29, is a remarkably soft, malleable, and ductile metal. Its exceptional thermal and electrical conductivity makes it indispensable in numerous applications. Freshly exposed pure copper is distinguished by its pinkish-orange hue. Copper serves as an essential conductor of heat and electricity, a versatile building material, and a crucial component in various metal alloys. Produced through advanced melting technology, our Copper Sputtering Target is extensively utilized in semiconductor manufacturing, decorative coatings, and advanced packaging industries.

We specialize in producing copper sputtering targets with purity levels ranging from 99.9% to an astounding 99.9999%, and we achieve an impressive oxygen content of less than 1ppm. These targets are primarily applied in display screens, touch screen wiring, solar light absorbing layers, semiconductor wiring, and protective films. Beyond planar copper sputtering targets (up to maximum G8.5 generation), we also manufacture copper rotary targets, predominantly for the touch screen industry. By overcoming significant challenges in grain breakage through extensive deformation and twin growth control, we ensure a fine, uniform microstructure. This results in lower erosion rates and reduced sensitivity to particle formation during sputtering, enhancing the overall performance and longevity of the targets.
Product Parameters

High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
Application:
Preparation Process of Copper Sputtering Target
Material Preparation - Electrolytic Purification & Electron Beam Melting - Chemical Analysis - Forging - Rolling - Annealing - Metallographic Inspection - Machining - Dimensional Inspection - Cleaning - Final Inspection - Packaging

Copper Sputtering Target and Its Preparation Method
The copper is meticulously purified from 99.95% to achieve purity levels of 99.99%, 99.999%, and an astounding 99.9999% through a series of rigorous electrolysis and regional smelting processes. Known for achieving the highest purity in China at approximately 99.9999% (6N), the high-purity copper ingots serve as the cornerstone of our production. Through expert forging, rolling, and heat treatment, the crystal grains in the copper ingots are significantly reduced in size, enhancing density to meet the stringent requirements for sputtering targets. The high-purity copper material is then meticulously processed with precision machining, ensuring superior surface quality and the exact target dimensions required for vacuum coating machines.

Other Alloy Forms of Copper Sputtering Targets
We offer a diverse range of alloy targets including Tin-Copper, ***-Copper, Tungsten-Copper, Silver-Copper, Copper-Phosphorus, Nickel-Copper, and more.

Related Products:
High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
Company Profile

Factory:
Founded in 2014, Changsha Xinkang Advanced Materials Co., Ltd. is a premier factory dedicated to the cutting-edge research, development, production, processing, sales, and service of superior metal materials. Our extensive product range includes: Metal elements, Alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, Metal powder, alloy powder, and bespoke metal items. Adhering to the highest industry standards such as GB/T, ASTM/B ASME SB, AMS, DIN, and JIS, we tailor our products to meet specific customer demands. These products are extensively employed across various industries including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instruments, metallurgy, automotive, and more. Located in Changsha, Hunan, our state-of-the-art facility spans 4000 square meters and holds certifications for ISO9001:2015 and ISO14001:2015 management systems. Our modern factory is outfitted with cutting-edge equipment and staffed by a large team of expert technicians. To guarantee superior quality, we employ advanced testing instruments such as carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our combination of professional technicians, skilled workers, and advanced machinery ensures that we deliver top-notch products and services. Our high-quality products, competitive pricing, prompt delivery, and exceptional after-sales service have earned us a stellar reputation in markets including the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya.
High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
Certifications

High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
Factory and Equippments

High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
Packaging & Shipping

High Purity 99.95% Oxygen Free Copper Metal C10100 C11000 C12200
FAQ

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