High Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications

Product Details
Customization: Available
Type: Metal Target
Shape: Rectangle

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  • High Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications
  • High Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications
  • High Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications
  • High Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications
  • High Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications
  • High Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications
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Basic Info.

Model NO.
XK-Ge02
Certification
TUV, ISO, CE
Dimension
Customized
Purity
99.9999%,99.999%,99.99%
Application
PVD Coating
Density
5.323G/Cm3
Transport Package
Vacuum Sealed Package Inside; Carton or Wooden CAS
Trademark
XINKANG
Origin
Changsha, China
HS Code
8486909900
Production Capacity
5000pieces/Year

Product Description

Product Description

The following table is a component analysis certificate for  5N Ge sputtering target. The analytical methods used are:
1. Analysis of metal elements using GDMS or ICP-OES;
2. Gas element analysis using LECO.
Material Germanium Ge  
Purity Ge ≥99.999%  
Elements Actual Spec Units Elements Actual Spec Units Elements Actual Spec Units
Li <0.001   ppm Zn <0.005   ppm Pb <0.005   ppm
B <0.001   ppm Ga <0.01   ppm Bi <0.005   ppm
F <0.05   ppm Ge Matrix   wt% Y <0.01   ppm
Na <0.005   ppm As <0.1   ppm Th <0.001   ppm
Mg <0.005   ppm Se <0.05   ppm Er <0.005   ppm
Al <0.005   ppm Zr <0.01   ppm Ru <0.005   ppm
Si 0.14   ppm Nb <0.005   ppm Rb <0.005   ppm
P <0.005   ppm Mo <0.01   ppm Sr <0.005   ppm
Cl <0.1   ppm Pd <0.01   ppm Sc <0.001   ppm
K <0.05   ppm Ag <0.01   ppm Be <0.001   ppm
Ca <0.01   ppm Sn <0.05   ppm Rh <0.005   ppm
Ti <0.001   ppm Sb <0.05   ppm Cd <0.1   ppm
V <0.001   ppm Ba <0.01   ppm        
Cr <0.005   ppm Hf <0.005   ppm        
Mn <0.05   ppm Ta Source   ppm C     ppm
Fe <0.05   ppm W <0.005   ppm S     ppm
Co <0.001   ppm Pt <0.005   ppm O     ppm
Ni <0.005   ppm Au <0.05   ppm N     ppm
Cu <0.005   ppm Hg <0.005   ppm H     ppm

High Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced ApplicationsHigh Purity 99.999% Pure Germanium Sputtering Target for Advanced Applications

 

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