• 99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
  • 99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
  • 99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
  • 99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
  • 99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications

99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications

Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.50%
Type: Ceramic Plate
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Customization:
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Overview

Basic Info.

Model NO.
XK-Y2O3
Materials
Y2o3
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3824909990
Production Capacity
10000PCS/Month

Product Description

99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
Product Description

XinKang Factory Supplies Premier Top-Ranking 99.99% High Density Y2O3 Target Yttria Yttrium Oxide Ceramic Sputtering Target
Name Yttrium Oxide Ceramic Sputtering Target / Y2O3 ceramic targets
Material Yttrium Oxide Y2O3 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Y Density 4.47g/cm3
Y Melting Point 1522°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:Xinkang proudly produces and supplies an extensive array of ceramic sputtering targets and compound targets, encompassing oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets, sulfide sputtering targets, and more. Our sophisticated production technology is at the heart of our excellence.The hot press method forms the backbone of our ceramic sputtering targets production. From the meticulous selection of raw materials to the precise control of temperature, pressure, and time during hot press sintering, our adherence to stringent production processes ensures that our ceramic sputtering targets meet the highest standards.Our targets boast high purity, remarkable density, uniform surface color free from spots and cracks, providing end-users with consistent erosion rates and the ability to achieve high-purity, homogeneous thin films throughout the PVD process.
Yttrium Oxide Sputtering Target;
Purity: 99.99%;
Production Method: Hot Press Sintering;
Available Dimensions:
Circular Target: Diameter = 3 mm;
Rectangular Target: Length = 3 mm;
Minimal Order Quantity: 1 piece;
Type of Bonding: Indium, Elastomer;
Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
NiO Sputtering Target
MoO3 Sputtering Target
WO3 Sputtering Target
LiFePO4 Sputtering Target
ZnS Sputtering Target
Bi2Te3 Sputtering Target
Ga2O3 Sputtering Target
Introducing the In2O3 Sputtering Target: Crafted with precision to meet your advanced material needs, our Indium Oxide (In2O3) target delivers unparalleled purity and performance for a variety of high-tech applications.
Discover the Ta2O5 Sputtering Target: Experience the superior quality and reliability of our Tantalum Pentoxide (Ta2O5) target, designed specifically to excel in cutting-edge technological and industrial processes.
Explore the Nb2O5 Sputtering Target: Our Niobium Pentoxide (Nb2O5) target offers exceptional purity and consistency, making it an ideal choice for sophisticated applications in advanced material science and engineering.
Product Parameters

High-Performance Hafnium Oxide Sputtering Target
/ HfO2 Ceramic Targets COA - Certificate of Analysis
99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
Diverse Applications:
1. Enhance and optimize surface properties of materials, such as increasing hardness, wear resistance, corrosion resistance, and more.
2. Innovatively used to develop new materials or elevate the performance of existing ones, including applications in solar cells, LEDs, flat-panel displays, and beyond.
3. Essential in the creation of advanced electronic components, such as transistors, integrated circuits, and similar devices.
4. Crucial for the development of superconductors, optical films, sensors, and a wide array of other specialized materials.

Explore Our Related High-Quality Products:
99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Established in 2014, Changsha Xinkang Advanced Materials Co., Ltd. stands as a distinguished leader in the realm of high-quality metal materials. Our expertise encompasses the meticulous research, innovative development, precise production, tailored processing, strategic sales, and exceptional service. Our diverse product portfolio includes premier metal elements, sophisticated alloys, cutting-edge metal sputtering targets, advanced alloy targets, superior ceramic targets, top-tier evaporation materials, high-grade metal powder, and bespoke alloy powder, along with other specialized metal items. Stringently adhering to GB/T, ASTM/B, ASME SB, AMS, DIN, JIS standards, as well as bespoke client specifications, we ensure unparalleled quality in every product. Our offerings cater to an expansive array of industries, including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive sectors. Situated in Changsha, Hunan, our state-of-the-art facility spans 4000 square meters and upholds ISO9001:2015 and ISO14001:2015 certifications. We are equipped with the latest technology and supported by a highly skilled team of technicians, utilizing advanced testing instruments such as carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to guarantee superior quality. Our unwavering commitment to excellence, competitive pricing, prompt delivery, and exceptional after-sales service has garnered us a dedicated clientele across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Discover the pinnacle of metal materials and services with us.
99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
Certifications

99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
Factory and Equippments

99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
Packaging & Shipping

99.99% Pure Yttrium Oxide Ceramic Sputtering Target for Y2o3 Yttria Applications
FAQ

1. Are you a trading company or a manufacturer?

Xinkang: We proudly stand as a dedicated manufacturer with over a decade of unrivaled expertise in the advanced materials sector.

2. How long is your delivery time?

Xinkang: For regular-sized items or samples, shipment will be dispatched within 3-5 days. For batch quantities, expect a prompt delivery time of approximately 15 days.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: Absolutely not! We embrace flexibility with no MOQ, readily supporting sample orders to meet your needs.

4. What are your payment methods?

Xinkang: We offer a variety of payment methods for your convenience, including T/T in advance, PayPal, Western Union, and more.

Feel free to contact us anytime! Your inquiries are always welcome.

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Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001