Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes

Product Details
Customization: Available
Type: Ceramic Target
Certification: TUV, ISO, CE

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ISO 9001, ISO 14001
  • Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes
  • Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes
  • Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes
  • Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes
  • Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes
  • Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes
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Basic Info.

Purity
99.99%
Size
Customized
MOQ
1 PC
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
Categary
Coating Material
Usage
Semi-Conductor
QC
100% Before Shipment
Product
Vanadium Dioxide Sputtering Target
Specification
customized
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

COMPANY PROFILE:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering ProcessesVanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer     


Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes

OUR ADVANTAGE

1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm     

Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering ProcessesVanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering ProcessesVanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes

PRODUCTION PROCESS

Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,

vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center, 

grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc


Our Certificates

1. We are an ISO9001 certified company.

2. We've been issued SGS Report.

3. We've been  awarded as a High-Tech Enterprise.

4. We've been invested by the National Fund for High-end Equipment. 

Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes

Our Exhibition

We have been attended exhibitions in Korea, Japan, USA, German, etc.
Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes

Application

Magnetic data storage/ Solar photovoltaic/ Glass coating 

Semi-conductor/ Flat panel display/ Decoration coating

Vanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering ProcessesVanadium Dioxide Target Vo2 Sputtering Target for Efficient PVD Sputtering Processes                                                             
                                              
 

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