High Purity Tantalum Nitride Sputter Target

• Type: Ceramic Target
• Shape: Round
• Certification: TUV, ISO, CE
• Dimension: Customized
• Purity: 99.5%
• Application: PVD Coating
• Chemical Composition: 99.5% Tan
• MOQ: 1 PC
• Packing: Vacuum Sealed
• Certificated: ISO 9001, 14001
• Delivery: 7-15 Days
• Surface: Smooth
• Material: Tantalum Nitride
• Transport Package: Vacuum Sealed Package
• Specification: customized
• Trademark: XINKANG
• Origin: Changsha, China
• HS Code: 8486909900
• Production Capacity: 5000pieces/Year

Product Description

Product Name: High Purity Tantalum Nitride Sputtering Target TaN

Category: Target Material

Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor deposition

Description: Elevate your thin film technology with the unparalleled quality of our High Purity Tantalum Nitride Sputtering Target. Specifically engineered for the semiconductor industry, this advanced ceramic target material is the pinnacle choice for PVD coating applications. Boasting a high purity composition, our tantalum nitride target guarantees superior performance across all vacuum deposition processes. Achieve precise, uniform thin film deposition effortlessly, courtesy of the exceptional craftsmanship of this sputtering target. Enhance the efficiency and effectiveness of your PVD coating operations today with our state-of-the-art tantalum nitride sputtering target. Invest in excellence for all your thin film technology requirements.