• 99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
  • 99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
  • 99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
  • 99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
  • 99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
  • 99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes

99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes

Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%
Type: Ceramic Plate
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Customization:
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Overview

Basic Info.

Model NO.
XK-ZnO
Materials
ZnO
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3812100000
Production Capacity
10000PCS/Month

Product Description

99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
Product Description

XinKang Factory Supplies Premier Top-Ranking 99.99% Pure Zinc Oxide Sputtering Target ZnO Ceramic Magnetron Target for Coating Ceramic Sputtering Target
Name Zinc Oxide Ceramic Sputtering Target / ZnO ceramic targets
Material Zinc Oxide ZnO Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color Yellow Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Zn Density 7.133g/cm3
Zn Melting Point 419°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:Xinkang can produce and supply a comprehensive range of ceramic sputtering targets and compound targets, including oxide sputtering targets, carbide sputtering targets, fluoride sputtering targets, sulfide sputtering targets, and more. Our advanced production technologyfor ceramic sputtering targets involves hot press techniques. From the careful selection of raw materials to the meticulous control of temperature, pressure, andsintering time, we adhere to rigorous production processes. This ensures our ceramic sputtering targets featureexceptional high purity, high density, and uniform surface color without spots or cracks, allowing end users to achieve consistenterosion rates and produce high-purity, homogeneous thin films during the PVD process.
Zinc Oxide Sputtering Target;
Purity: 99.95%;
Production Method: Cold Press Sintering;
Available Dimensions:
Circular Target: Diameter = 3 mm;
Rectangular Target: Length = 3 mm;
Rotary Target: L 4000 x Wall Thickness 15mm;
Minimum Order Quantity: 1 piece;
Type of Bonding: Indium, Elastomer;
Application Fields: Thin-Film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
NiO Sputtering Target
MoO3 Sputtering Target
WO3 Sputtering Target
Introducing the LiFePO4 sputtering target: a premium solution engineered for superior performance in thin film deposition. Ideal for applications requiring high energy density and long cycle life.
Discover the ZnS sputtering target: crafted for excellence in optical coatings and thin-film applications. This high-purity zinc sulfide target delivers unmatched quality and consistency.
Presenting the Bi2Te3 sputtering target: tailored for advanced thermoelectric applications. It offers optimal efficiency and reliability in energy conversion processes.
Explore the Ga2O3 sputtering target: designed for cutting-edge semiconductor and optoelectronic applications. This gallium oxide target ensures high purity and exceptional performance.
Unveil the In2O3 sputtering target: perfect for transparent conducting oxides and display technologies. This indium oxide target is synonymous with superior conductivity and transparency.
Introducing the Ta2O5 sputtering target: engineered for high-k dielectrics and optical coatings. This tantalum pentoxide target guarantees excellent dielectric properties and durability.
Presenting the Nb2O5 sputtering target: perfect for capacitors and optical applications. This niobium pentoxide target offers high purity and exceptional performance in advanced material applications.
Product Parameters

Hafnium Oxide Sputtering Target
/ HfO2 Ceramic Targets COA
99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
Application:
1. Enhance and optimize the surface properties of materials, including increased hardness, superior wear resistance, and robust corrosion resistance.
2. Essential in the development of groundbreaking materials or the enhancement of existing ones, particularly in cutting-edge technologies like solar cells, LEDs, and flat panel displays.
3. Crucial for the fabrication of high-performance electronic components, such as transistors and integrated circuits.
4. Integral in the creation of superconductors, optical films, advanced sensors, and a variety of other high-tech materials.

Related Products:
99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier facility dedicated to the research, development, production, processing, sales, and service of superior metal materials. With an expansive product repertoire that includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and custom metal items, we set the benchmark for quality and innovation. Upholding the rigorous standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and bespoke client requirements, our offerings cater to a diverse array of industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our state-of-the-art 4000 square meter factory, strategically located in Changsha, Hunan, boasts ISO9001:2015 and ISO14001:2015 certifications. Equipped with the latest technology and a team of adept technicians, we utilize advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to deliver unmatched product quality. Our unwavering dedication to excellence, competitive pricing, prompt delivery, and exceptional after-sales service have garnered us a devoted clientele spanning the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Experience the pinnacle of metal materials and services with us.
99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
Certifications

99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
Factory and Equippments

99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
Packaging & Shipping

99.9% Pure Zinc Oxide Ceramic Magnetron Target for Coating in Various Sizes
FAQ

1. Are you a trading company or a manufacturer?

Xinkang: We proudly stand as a dedicated manufacturer with over a decade of unrivaled expertise in the advanced materials sector, providing top-notch solutions and exceptional quality.

2. How long is your delivery time?

Xinkang: For regular-sized items or samples, shipment will be dispatched within 3-5 days. For batch quantities, expect a prompt delivery time of approximately 15 days, ensuring efficient and reliable service.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: Absolutely not! We embrace flexibility with no MOQ, readily supporting sample orders to meet your needs, and providing seamless access to our high-quality products.

4. What are your payment methods?

Xinkang: We offer a variety of payment methods for your convenience, including T/T in advance, PayPal, Western Union, and more, ensuring a smooth and hassle-free transaction process.

Feel free to contact us anytime! Your inquiries are always welcome, and we're here to assist you with any questions or requirements you may have.

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