• High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target
  • High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target
  • High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target
  • High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target
  • High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target
  • High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

Shape: Plate,Circle,Pellets
Certification: ISO
CAS No: 7784-18-1
Usage: PVD Film Coating
Delivery Time: 7-21days
Keywords: Aluminum Fluoride Ceramic Material
Customization:
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Overview

Basic Info.

Model NO.
XK-AlF3 01
Size
D50.8X3mm or as Request
Purity
99-99.99%
Chemical Composition
Alf3
Appearance
Polished Surface
MOQ
1PC
Product Name
Aluminum Fluoride Ceramic Target
Package
Vacuum Blister
Transport Package
Vacuum Sealed Package
Specification
customized
Trademark
XinKang
Origin
Hunan, China
Production Capacity
1000000 Piece/Pieces Per Month

Product Description

Product Description

 

XinKang High Purity Materials Aluminum Fluoride AlF3 Ceramic Sputtering Target Aluminum Fluoride Ceramic Target

High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

Name Aluminum Fluoride AlF3 Ceramic targets
Purity 99%-99.99%
Size D50.8x3mm, D6x6mm,2inch,3inch, As request
CAS 7784-18-1
Density 1.914g/cm³
Melting Point 1291.4
Shape Planar target, Rotary target.Pellets, Piece, Bound with copper back panel.
MOQ 1PCS
Application Experiments materials,Evaporation materials, PVD Film Coating and etc

High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

Feature:

Aluminum Fluoride AlF3 is used as an analytical reagent, a catalyst and a by-fermentation inhibitor in ethanol production.

For the preparation of fluoride, white glaze manufacturing.

 

Alumina is a stable oxide of aluminum with the chemical formula Al2O3. Also known as bauxite in mining, pottery and materials science.

Properties: White solid insoluble in water, odorless, tasteless, extremely hard, easy to absorb moisture but not deliquescence (burned does not absorb moisture). Amphoteric oxide, soluble in inorganic acids and alkaline solutions, almost insoluble in water and non-polar organic solvents; relative density (d204) 4.0; melting point 2050°C. Storage: Keep in a sealed and dry place. SCRC100009 Uses: Used as analytical reagents, dehydration of organic solvents, adsorbents, organic reaction catalysts, abrasives, polishing agents, raw materials for smelting aluminum, and refractory materials

Application:

The use of titanium nitride

Applicable industries: aerospace industry, automotive industry, consumer goods processing, foundry/die casting, OEM distributors, semiconductor industry and other different fields. Applicable process range: pretreatment before surface electroplating, painting, glazing and PTFE coating; deburring and descaling of aluminum and alloy products; mold cleaning; pretreatment before metal sandblasting; dry grinding and wet grinding; Precision optical refraction; grinding of minerals, metals, glass and crystals; glass engraving and paint additives.

 

Alumina ceramics came into being in the ceramic industry--alumina ceramics is a ceramic material with Al2O3 as the main raw material and corundum as the main crystal phase. Because of its high mechanical strength, high hardness, and low high-frequency dielectric loss , high temperature insulation resistance, chemical corrosion resistance and good thermal conductivity and other excellent comprehensive technical performance and other advantages.

Application: Alumina Ceramic Sputtering Targets

High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

Other Related Sputtering Targets

Metal Target  Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets
Alloy Target Ni,Fe,Co,Cu,Al alloy. and special alloy 
Evaporation Materials Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc
Ceramic Targets Oxide Ceramic, Compound ceramic targets.
 
Company Information

 High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

High Purity Materials Aluminum Fluoride Alf3 Ceramic Sputtering Target Alf3 Compound Target

FAQ

 

1. Are you trading company or manufacturer ?
Xinkang: We are a professional manufacturer specialized in this field for over 10 years.

 

2: How long is your delivery time?
Xinkang: Shipment can be made in 5-7 days for those regular size, or samples , and 15-20 days for batch quantity. 
 
3: Do you have MOQ ? 
Xinkang: No, we support samples.

 

4: What is your payment method?
Xinkang: T/T in advance, Paypal , Western Union and etc.

 

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