Chromium Cr Target for Efficient Magnetron Sputtering Processes

Product Details
Customization: Available
Type: Metal Target
Shape: Square

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  • Chromium Cr Target for Efficient Magnetron Sputtering Processes
  • Chromium Cr Target for Efficient Magnetron Sputtering Processes
  • Chromium Cr Target for Efficient Magnetron Sputtering Processes
  • Chromium Cr Target for Efficient Magnetron Sputtering Processes
  • Chromium Cr Target for Efficient Magnetron Sputtering Processes
  • Chromium Cr Target for Efficient Magnetron Sputtering Processes
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Basic Info.

Model NO.
XK-Cr05
Certification
TUV, ISO, CE
Dimension
Customized
Purity
99.95%
Application
PVD Coating
Density
7.19g/cm3
Transport Package
Vacuum Sealed Package Inside; Carton or Wooden CAS
Trademark
XINKANG
Origin
Changsha, China
HS Code
8486909900
Production Capacity
5000pieces/Year

Product Description

Product Description

The following table is a component analysis certificate for  3N5  Cr sputtering target. The analytical methods used are:
1. Analysis of metal elements using GDMS or ICP-OES;
2. Gas element analysis using LECO.
Elements Actual Spec Units Elements Actual Spec Units Elements Actual Spec Units
Li     ppm Zn     ppm Pb     ppm
B     ppm Ga     ppm Bi     ppm
F     ppm Ge     ppm Y     ppm
Na     ppm As     ppm Th     ppm
Mg <5   ppm Se     ppm Er     ppm
Al 50   ppm Zr <10   ppm Ru     ppm
Si 51   ppm Nb <10   ppm Rh     ppm
P     ppm Mo <20   ppm Os     ppm
Cl     ppm Pd     ppm Cd <2   ppm
K     ppm Ag     ppm        
Ca     ppm Sn     ppm        
Ti <10   ppm Sb     ppm        
V <10   ppm Ba <5   ppm        
Cr Matrix   wt% Hf     ppm        
Mn <5   ppm Ta     ppm C 36   ppm
Fe 82   ppm W <10   ppm S 20   ppm
Co 33   ppm Pt     ppm O 120   ppm
Ni 18   ppm Au     ppm N 20   ppm
Cu <10   ppm Hg     ppm H     ppm

Chromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering ProcessesChromium Cr Target for Efficient Magnetron Sputtering Processes


 

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