Application: | Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting |
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Flexural Strength: | Dont Know |
Purity: | 99.99%Min |
Type: | Zirconium Dioxide Tables |
Packaging: | 1PC Vacuum Forming |
Size: | Customized |
Customization: |
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Leading Manufacturer of Sputtering Target and Evaporation Materials
Description:
The Aluminum Nitride Sputtering Target from Changsha Xinkang Advanced Materials Co., Ltd. is an indispensable asset in the domain of thin film deposition. This premium material is pivotal in fabricating superior-quality thin films used across a plethora of sectors, including electronics and optics. Boasting extraordinary thermal conductivity and exceptional chemical stability, our Aluminum Nitride Sputtering Target guarantees uniform film deposition, thereby significantly enhancing the performance of thin film coatings. Its distinctive characteristics render it the top choice for both researchers and manufacturers. Employing our Aluminum Nitride Sputtering Target enables professionals to achieve precision and consistency in thin film deposition, fostering breakthroughs in technology and driving innovation forward.
Application:
Multilayer Film Coatings; Anti-Reflection Films; Nano-Hardening Processes; Glasses Coating Solutions.
1. Are you a trading company or manufacturer?
Xinkang: We are a professional manufacturer specializing in this field for over 10 years.
2. How long is your delivery time?
XinKang: Shipments can be made in 3-5 days for regular sizes or samples, and 15 days for bulk quantities.
3. Do you have a minimum order quantity (MOQ)?
XinKang: No, we support samples.
4. What is your payment method?
XinKang: We accept T/T in advance, PayPal, Western Union, and more.
We welcome you to contact us at any time!
Suppliers with verified business licenses