• 99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
  • 99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
  • 99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
  • 99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
  • 99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
  • 99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications

Application: Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting
Flexural Strength: Dont Know
Purity: 99.99%Min
Type: Zirconium Dioxide Tables
Packaging: 1PC Vacuum Forming
Size: Customized
Customization:
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  • Company Information:
Overview

Basic Info.

Model NO.
XK-AlN 03
Delivery
7-15days
Certificate
ISO9001:2015
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
D50.8mm D101.6mm support
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
Product Description

Leading Manufacturer of Sputtering Target and Evaporation Materials

Product Name Aluminum Nitride Sputtering Target  
Available Purity 99.9%min
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size D50.8mm  D101.6mm support customized
Technolgy Sintering
Type of Bonding Indium, Elastomer
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Solar, Optical,Process,Decoration,LED,Semi,
Related products AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203,
AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.

Description:
The Aluminum Nitride Sputtering Target from Changsha Xinkang Advanced Materials Co., Ltd. is an indispensable asset in the domain of thin film deposition. This premium material is pivotal in fabricating superior-quality thin films used across a plethora of sectors, including electronics and optics. Boasting extraordinary thermal conductivity and exceptional chemical stability, our Aluminum Nitride Sputtering Target guarantees uniform film deposition, thereby significantly enhancing the performance of thin film coatings. Its distinctive characteristics render it the top choice for both researchers and manufacturers. Employing our Aluminum Nitride Sputtering Target enables professionals to achieve precision and consistency in thin film deposition, fostering breakthroughs in technology and driving innovation forward.

Application:
Multilayer Film Coatings; Anti-Reflection Films; Nano-Hardening Processes; Glasses Coating Solutions.

Related Products

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
Inspection Equipment

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
Factory Equipment and Process

• High-Performance Vacuum Furnace
• Advanced Sintering Furnace
• Robust Forging Machine
• Precision Rolling Machine
• Versatile Lathe
• High-Accuracy Grinder
• Cutting-Edge CNC Machine
• Efficient Water Cutting Machine
• Precise Wire Cutting Machine
• Reliable Muffle Furnace
• Innovative Rotary Forging Machine
• High-Capacity Hydraulic Press
• Efficient Leveling Machine
• High-Speed Punching Machine
• Advanced Polishing Machine
• High-Precision Abrasive Belt Machine
• Ultrasonic Cleaning Machine
• Ultrasonic Cleaning Machine
99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
Product Application:

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
Company Information:

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
Our factory spans an impressive 4000 square meters and is proudly certified with both the ISO9001:2015 quality management system and the ISO14001:2015 environmental management system. Equipped with cutting-edge technology and staffed by a dedicated team of highly skilled technicians, we ensure that every product meets the highest quality standards. Rigorous testing using carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, and stiffness testers guarantees unparalleled excellence. Our professional technicians, adept workers, and state-of-the-art equipment enable us to deliver superior products and services. Our offerings have reached markets across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, earning accolades for their exceptional quality, competitive pricing, timely delivery, and outstanding after-sales service.
No matter the order volume or size, we are committed to meeting your requirements, a promise we have upheld for years.
99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications

99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications


99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications
Standard Export Packaging: Vacuum-sealed packaging inside; export carton or wooden case outside.
Shipments can be made via FedEx, DHL, UPS, *** express, etc.
For gross weight ≤100KG: For larger shipments ≥100KG, the shipping method will be discussed with you.
99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications99.9% Pure Aluminum Nitride Sputtering Target for Advanced Scientific Research Applications

1. Are you a trading company or manufacturer?

Xinkang: We are a professional manufacturer specializing in this field for over 10 years.


2. How long is your delivery time?

XinKang: Shipments can be made in 3-5 days for regular sizes or samples, and 15 days for bulk quantities.

3. Do you have a minimum order quantity (MOQ)?

XinKang: No, we support samples.

4. What is your payment method?

XinKang: We accept T/T in advance, PayPal, Western Union, and more.

We welcome you to contact us at any time!

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Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001