Ceramic PVD Coating Ruthenium Dioxide Sputter Target

• Type: Ceramic Target
• Shape: Round
• Certification: TUV, ISO, CE
• Dimension: Customized
• Purity: 99.9%
• Application: PVD Coating
• Model NO.: XK-RuO2
• Chemical Composition: 3n Ruo2
• MOQ: 1 PC
• Packing: Vacuum Sealed
• Certificated: ISO 9001, 14001
• Delivery: 7-15 Days
• Surface: Smooth
• Material: Ruthenium Oxide
• Transport Package: Vacuum Sealed Package
• Specification: customized
• Trademark: XINKANG
• Origin: Changsha, China
• HS Code: 8486909900
• Production Capacity: 5000pieces/Year

Product Description

Product Name: High Purity RuO2 Sputtering Target

Category: Target Material

Keywords: Thin Film Coating Materials, RuO2 sputtering target, High purity ruthenium oxide, Thin film deposition material, Sputter coating applications, Semiconductor industry target, Optical coating material, Ceramic sputtering target, PVD coating material, Ruthenium dioxide target, Customized sputter target

Description: Elevate your thin film deposition processes with our High Purity RuO2 Sputtering Target, meticulously crafted for excellence. This superior target is tailored for diverse sputter coating applications across the semiconductor and optical industries. Composed of the finest ruthenium oxide, this ceramic sputtering target offers outstanding performance and enduring durability. As a trusted PVD coating material, it ensures precise and uniform film deposition every time. Fully customizable to meet your unique specifications, our RuO2 sputtering target is the optimal solution for your thin film coating requirements. Rely on the unparalleled quality and efficiency of our product to significantly enhance your operations.