| Customization: | Available |
|---|---|
| Type: | Metal Target |
| Shape: | Round |
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| Product: | hafnium sputtering target |
| Purity: | 99.95% |
| Size: | customized |
| Shape: | Planar |
| Packing: | Vacumm sealed, wooden case |
Hafnium Sputtering Targets are produced by EB melting technology, with very lower zirconium content. It usually used for optical coating.
Features
Chemical Composition: pure Hf
Available Purity: 3N5
Production Technology: EB melting
Shapes: planar targets
Average Grain Size: < 100um
Company Profile:
Since 2014
Specializing in high purity sputtering targets.
Leader manufacturer of sputtering materials in China.
Qualified the world certificates such as ISO9001:2008 and SGS.
Comprehensive in R&D, manufacturing, and sales on thin film materials.
Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.
Professional and efficient
We own a strong teamwork of professional R&D team,
manufacturing team, sales team and after-sales service team.
Provide you 12 hours fastest service.
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