Customization: | Available |
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Application: | Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting |
Flexural Strength: | Dont Know |
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Leading Manufacturer of Sputtering Targets and Evaporation Materials
Description:
The Aluminum Nitride Sputtering Target is an indispensable asset in the realm of thin film deposition. This exceptional material is pivotal for producing high-caliber thin films used in an array of applications, including electronics and optics. Renowned for its superior thermal conductivity and remarkable chemical stability, the Aluminum Nitride Sputtering Target guarantees uniform film deposition, significantly boosting the performance of thin film coatings. Its distinctive properties make it the top choice for both researchers and manufacturers. By leveraging the Aluminum Nitride Sputtering Target, professionals can attain precise and dependable thin film deposition, driving forward technological advancements and fostering innovation.
Application:
Multilayer films; Anti-reflection coatings; Nano-hardening treatments; Eyeglass coatings.
1. Are you a trading company or manufacturer?
XinKang: We are a professional manufacturer with over a decade of specialization in this field.
2. How long is your delivery time?
XinKang: For regular sizes or samples, we can ship within 3-5 days. For batch quantities, our delivery time is 15 days.
3. Do you have a minimum order quantity (MOQ)?
XinKang: No, we support samples.
4. What are your payment methods?
XinKang: We accept T/T in advance, PayPal, Western Union, and more.
Feel free to contact us anytime!