• Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
  • Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
  • Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
  • Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
  • Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
  • Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering

Application: Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting
Flexural Strength: Dont Know
Purity: 99.99%Min
Type: Zirconium Dioxide Tables
Packaging: 1PC Vacuum Forming
Size: Customized
Customization:
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Overview

Basic Info.

Model NO.
XK-AlN 03
Delivery
7-15days
Certificate
ISO9001:2015
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
D50.8mm D101.6mm support
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
Product Description

Leading Manufacturer of Sputtering Targets and Evaporation Materials

Product Name Aluminum Nitride Sputtering Target  
Available Purity 99.9%min
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size D50.8mm  D101.6mm support customized
Technolgy Sintering
Type of Bonding Indium, Elastomer
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Solar, Optical,Process,Decoration,LED,Semi,
Related products AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203,
AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.

Description:
The Aluminum Nitride Sputtering Target is an indispensable asset in the realm of thin film deposition. This exceptional material is pivotal for producing high-caliber thin films used in an array of applications, including electronics and optics. Renowned for its superior thermal conductivity and remarkable chemical stability, the Aluminum Nitride Sputtering Target guarantees uniform film deposition, significantly boosting the performance of thin film coatings. Its distinctive properties make it the top choice for both researchers and manufacturers. By leveraging the Aluminum Nitride Sputtering Target, professionals can attain precise and dependable thin film deposition, driving forward technological advancements and fostering innovation.

Application:
Multilayer films; Anti-reflection coatings; Nano-hardening treatments; Eyeglass coatings.

Related Products

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
Inspection Equipment

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
Factory Equipment and Process

• Advanced Vacuum Furnace
• High-Efficiency Sintering Furnace
• Precision Forging Machine
• High-Performance Rolling Machine
• Precision Lathe
• Industrial-Grade Grinder
• Cutting-Edge CNC Machinery
• Expert Water Cutting Technology
• Precision Wire Cutting Equipment
• High-Temperature Muffle Furnace
• Advanced Rotary Forging Machine
• Hydraulic Press for Heavy-Duty Tasks
• Precision Leveling Machine
• High-Speed Punching Machine
• Superior Polishing Machine
• Efficient Abrasive Belt Machine
• Ultrasonic Cleaning Machine
• Cutting-Edge Cleaning Technology
Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
Product Application:

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
Company Information:

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
Spanning an impressive 4000 square meters, Changsha Xinkang Advanced Materials Co., Ltd. is a paragon of excellence, proudly holding both ISO9001:2015 and ISO14001:2015 certifications. Our state-of-the-art facility is fully equipped with cutting-edge technology and a dedicated team of experts. We ensure top-tier quality through rigorous testing using carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, stiffness testers, and more. Our skilled professionals and advanced equipment enable us to deliver superior products and services. Our exceptional quality, competitive pricing, timely delivery, and unmatched after-sales support have earned us the trust and appreciation of clients across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya.
Whether your order is large or small, we are committed to meeting your needs with the highest level of dedication, a practice we've maintained for years.
Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering

Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering


Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering
Standard Export Packaging: Vacuum-sealed packaging inside; sturdy export cartons or wooden cases outside.
We offer shipment options through FedEx, DHL, UPS, *** express, and more.
For orders with a gross weight ≤100KG, we use express services. For larger shipments ≥100KG, we will discuss the best shipping method with you.
Customized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research SputteringCustomized 99.9% Pure Aluminum Nitride Planar Target for Scientific Research Sputtering

1. Are you a trading company or manufacturer?

XinKang: We are a professional manufacturer with over a decade of specialization in this field.


2. How long is your delivery time?

XinKang: For regular sizes or samples, we can ship within 3-5 days. For batch quantities, our delivery time is 15 days.

3. Do you have a minimum order quantity (MOQ)?

XinKang: No, we support samples.

4. What are your payment methods?

XinKang: We accept T/T in advance, PayPal, Western Union, and more.

Feel free to contact us anytime!

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Management System Certification
ISO 9001, ISO 14001