High Purity Ruo2 Sputtering Target

• Type: Ceramic Target
• Shape: Round
• Certification: TUV, ISO, CE
• Dimension: Customized
• Purity: 99.9%
• Application: PVD Coating
• Chemical Composition: 3n Batio3
• MOQ: 1 PC
• Packing: Vacuum Sealed
• Certificated: ISO 9001, 14001
• Delivery: 7-15 Days
• Surface: Smooth
• Material: Barium Titanium Oxide
• Transport Package: Vacuum Sealed Package
• Specification: customized
• Trademark: XINKANG
• Origin: Changsha, China
• HS Code: 8486909900
• Production Capacity: 5000pieces/Year

Product Description

Product Name: High Purity Ruo2 Sputtering Target

 

Category: Target Material

 

Keywords: Thin Film Coating Materials, Ruo2 sputtering target, High purity ruthenium oxide, Thin film deposition material, Sputter coating applications, Semiconductor industry target, Optical coating material, Ceramic sputtering target, PVD coating material, Ruthenium dioxide target, Customized sputter target

 

Description: Enhance your thin film deposition processes with our High Purity Ruo2 Sputtering Target. This target is ideal for various sputter coating applications in the semiconductor and optical industries. Made from high purity ruthenium oxide, this ceramic sputtering target ensures excellent performance and durability. It is a reliable PVD coating material that guarantees precise and uniform film deposition. Customized to meet your specific requirements, our Ruo2 sputtering target is the perfect choice for your thin film coating needs. Trust in the quality and efficiency of our product to elevate your operations to the next level.