| Customization: | Available |
|---|---|
| Type: | Ceramic Target |
| Shape: | Round |
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
Product Name: High Purity Ruo2 Sputtering Target
Category: Target Material
Keywords: Thin Film Coating Materials, Ruo2 sputtering target, High purity ruthenium oxide, Thin film deposition material, Sputter coating applications, Semiconductor industry target, Optical coating material, Ceramic sputtering target, PVD coating material, Ruthenium dioxide target, Customized sputter target
Description: Elevate your thin film deposition processes with the unparalleled performance of our High Purity Ruo2 Sputtering Target. Engineered for excellence, this target is ideal for a diverse range of sputter coating applications in both the semiconductor and optical industries. Composed of high purity ruthenium oxide, this superior ceramic sputtering target guarantees exceptional performance and durability. As a reliable PVD coating material, it ensures precise and uniform film deposition that meets the highest standards. Tailored to your specific requirements, our Ruo2 sputtering target is the ultimate solution for all your thin film coating needs. Depend on the outstanding quality and efficiency of our product to propel your operations to unprecedented heights.
){kind=link}