99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating

Product Details
Customization: Available
Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%

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  • 99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
  • 99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
  • 99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
  • 99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
  • 99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
  • 99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-SiO2
Materials
Silicon Dioxide
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3824999999
Production Capacity
10000PCS/Month

Product Description

99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
Product Description
 
XinKang Factory 99.995% Purity SiO2 Planar Sputtering Target Silicon Dioxide Ceramic target for Coating
Name Silicon Dioxide Ceramic Sputtering Target / SiO2 Ceramic targets
Material Silicon Dioxide SiO2 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.2g/cm3
Melting Point 1723°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)
 
Description:

Silica, also known as silica, has the chemical formula SiO2. There are two types of crystalline silica and amorphous silica in nature. SiO2 has a higher melting point and boiling point (melting point 1723°C, boiling point 2230°C). The refractive index is approximately 1.6.

Application Fields: Used as analytical reagents, fluorophores, and photoconductor materials. Also used in the manufacture of dyes, coatings, pigments, glass, cured oil, etc. Used as various optical filters and laser window coatings.
Thin-film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Silica is a raw material for manufacturing glass, quartz glass, water glass, optical fiber, important components of the electronic industry, optical instruments, handicrafts and refractory materials. It is an important material for scientific research.
Uses of silica: flat glass, glass products, foundry sand, glass fiber, ceramic glaze, anti-rust sand blasting, filter sand, flux, refractory materials and manufacturing of lightweight bubble concrete (Autoclaved Lightweight Concrete). Used to manufacture important components, optical instruments and handicrafts for the electronics industry. Silica is an important raw material for making optical fibers. It can be used to make quartz glass and is often used to make high-temperature chemical instruments. Quartz sand is commonly used as glass raw material and building materials.


Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
Premium NiO Sputtering Target - Designed for Superior Performance
High-Quality MoO3 Sputtering Target - Engineered for Precision
Exceptional WO3 Sputtering Target - Unmatched Consistency
Top-Tier LiFePO4 Sputtering Target - Reliable and Efficient
Advanced ZnS Sputtering Target - Optimal for High-Performance Applications
Superior Bi2Te3 Sputtering Target - Ideal for Cutting-Edge Technologies
Premium Ga2O3 Sputtering Target - Engineered for Excellence
High-Grade In2O3 Sputtering Target - Consistent and Reliable
Top-Quality Ta2O5 Sputtering Target - Perfect for Precision Applications
Exceptional Nb2O5 Sputtering Target - Designed for Durability and Performance
Product Parameters

/ SiO2 Ceramic Targets Certificate of Analysis (COA)
99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
Application:
1. Enhance and preserve the surface attributes of materials, elevating hardness, wear resistance, corrosion resistance, and more.
2. Crucial for the creation of cutting-edge materials and the enhancement of existing ones, applicable in solar cells, LEDs, flat panel displays, and beyond.
3. Essential in the fabrication of electronic components, including transistors and integrated circuits.
4. Vital for the development of superconductors, optical films, sensors, and a variety of advanced materials.

Related Products:
99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc
 
Company Profile
 
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier factory specializing in the research, development, production, processing, sales, and service of high-quality metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and other customized metal items. We adhere to the stringent standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and custom requirements from our clients, ensuring top-notch quality across all our offerings. These products find wide applications in industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our state-of-the-art factory, spanning 4000 square meters, is situated in Changsha, Hunan, and is certified with ISO9001:2015 and ISO14001:2015 management systems. Equipped with cutting-edge technology and a highly skilled team of technicians, we employ advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure superior product quality. Our commitment to excellence, competitive pricing, timely delivery, and unparalleled after-sales service have earned us a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Join us in experiencing the finest in metal materials and services.
99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
Certifications

99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
Factory and Equippments

99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
Packaging & Shipping

99.995% Purity Sio2 Planar Sputtering Target Silicon Dioxide Ceramic Target for Coating
FAQ
 

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