Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions

Product Details
Customization: Available
Type: Alloy Target
Shape: Round

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  • Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
  • Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
  • Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
  • Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
  • Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
  • Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
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Basic Info.

Model NO.
XK-TiSi 02
Packaging
1PC Vacuum Package
Purity
99.9%
Size
Customized
Delivery
15-18days
Certificate
ISO9001:2015
MOQ
1PC
Availability
Target, Wire, Segment, Granule, Ingot, Sheet
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
1′′-8′′or as per your request
Trademark
No
Origin
China
HS Code
8112290000
Production Capacity
10000kgs/Month

Product Description

Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
Product Name Titanium-silicon sputtering targets
Available Purity 99.5%min,as you request
Available shape round, rectangular,pellets
Size 1'-10''mm,As per your request
Technolgy Sintering
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Evaporation materials,Vaccum coating,Process,Decoration,LED,Semi,
Related products Nickel based, cobalt based, iron bases,W, Mo, Ta, Nb, Zr, Ni, Cu, Cr, Sn, V, T

Description: Titanium-silicon sputtering targets are essential components in the production of thin films for various applications in industries such as electronics, optics, and solar energy. These advanced targets, crafted from a precise blend of titanium and silicon, ensure the accurate deposition of thin films onto substrates.

The key advantage of using titanium-silicon sputtering targets lies in their unmatched ability to produce high-quality thin films with excellent adhesion and uniformity. Ideal for applications that demand precise control over film thickness and composition, these targets are indispensable in the manufacturing of semiconductors and solar cells.

Overall, titanium-silicon sputtering targets play a crucial role in technology advancement by enabling the production of advanced thin films with superior properties. Their versatility and reliability make them invaluable tools for researchers and manufacturers pushing the boundaries of innovation in their respective fields.
Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
We proudly offer a Certificate of Analysis (COA) for all our products, ensuring you receive the highest quality materials with verified specifications. Trust in our commitment to excellence.
Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
Changsha Xinkang Advanced Materials Co., Ltd (XK) stands at the forefront of innovation, excelling in the R&D, manufacturing, and sales of advanced materials. Our extensive offerings include high-purity materials, tailored alloys, specialized compounds, and complex synthetic materials, catering to research institutes and high-tech enterprises globally. We boast a competitive edge in high-purity metals, rare-earth elements, powder materials, and coated substrates, among many other cutting-edge solutions.
Our products meet rigorous ASTM/B, ASME SB, AMS, DIN, JIS standards, and other custom specifications. These high-grade materials are trusted by professionals across various industries for their reliability and top-notch performance.
Our sputtering materials are extensively utilized across sectors such as petrochemical, aerospace, aviation, shipbuilding, energy, and medical industries,
as well as military, electronics, environmental protection, machinery, instruments, metallurgy, automotive, and
numerous other fields that demand precision and excellence.
Nestled in Changsha, Hunan, our state-of-the-art factory spans 4,000 square meters. We proudly adhere to the ISO 9001:2015 quality management system and ISO 14001:2015 environmental management system, signifying our commitment to quality and sustainability.
With certifications in both quality and environmental management,
we are equipped with the latest high-tech machinery and a highly skilled workforce. Our dedication to quality is reflected in our use of advanced testing equipment such as carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers.
Our stringent quality control measures ensure each product meets the highest standards,
providing exceptional reliability and performance. Our team of professional technicians and skilled workers,
coupled with advanced equipment, guarantees that we deliver top-tier products and services.
Our premium products are exported worldwide, reaching markets in the USA, Europe, the Middle East, Japan, Korea, Singapore,
India, and Kenya. Our unwavering dedication to quality, competitive pricing, timely delivery, and excellent after-sales service is highly recognized and appreciated by our global clientele.
Whether your order is large or small, we are committed to meeting your specific requirements, a commitment we have upheld for years.
No matter the order volume or size, we strive to meet your needs with utmost dedication and extensive experience.
Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions

Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions
Our standard export packaging includes vacuum-sealed packages within export cartons or sturdy wooden cases, ensuring product integrity during transit. Your products are safe with us.
We offer flexible shipment options via FedEx, DHL, UPS, *** express,
for orders weighing ≤100KG. For shipments ≥100KG, we will discuss the best shipping method to suit your needs, ensuring efficiency and cost-effectiveness.
Titanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized DimensionsTitanium-Silicon Sputtering Target for PVD Deposition, 99.9% Pure, Customized Dimensions

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