Customization: | Available |
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Application: | Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting |
Flexural Strength: | Dont Know |
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Renowned Sputtering Target and Evaporation Materials Manufacturer
Description:
The Aluminum Nitride Sputtering Target, a vital component in the realm of thin film deposition, is indispensable for producing top-tier thin films used across a multitude of applications, including electronics and optics. Boasting exceptional thermal conductivity and chemical stability, this advanced material guarantees uniform film deposition, significantly enhancing the performance of thin film coatings. Its distinctive properties make it the material of choice for both researchers and manufacturers. Employing the Aluminum Nitride Sputtering Target, professionals can attain precise and dependable thin film deposition, fostering remarkable advancements in technology and innovation.
Application:
Ideal for use in Multilayer Films, Anti-reflection Films, Nano-hardening processes, and Glasses Coating.
1. Are you a trading company or manufacturer?
Xinkang: We are a professional manufacturer with over 10 years of expertise in this field.
2. How long is your delivery time?
Xinkang: For regular sizes or samples, shipment can be made in 3-5 days. For batch quantities, it takes approximately 15 days.
3. Do you have a minimum order quantity (MOQ)?
Xinkang: No, we support sample orders.
4. What is your payment method?
Xinkang: We accept T/T in advance, PayPal, Western Union, and other methods.
Feel free to contact us at any time!