High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research

Product Details
Customization: Available
Application: Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting
Flexural Strength: Dont Know

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  • High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
  • High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
  • High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
  • High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
  • High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
  • High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
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  • Overview
  • Product Description
  • Related Products
  • Inspection Equipment
  • Factory Equipment and Process
  • Product Application:
  • Company Information:
Overview

Basic Info.

Model NO.
XK-AlN 03
Type
Zirconium Dioxide Tables
Packaging
1PC Vacuum Forming
Size
Customized
Delivery
7-15days
Certificate
ISO9001:2015
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
D50.8mm D101.6mm support
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
Product Description

Renowned Sputtering Target and Evaporation Materials Manufacturer

Product Name Aluminum Nitride Sputtering Target  
Available Purity 99.9%min
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size D50.8mm  D101.6mm support customized
Technolgy Sintering
Type of Bonding Indium, Elastomer
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Solar, Optical,Process,Decoration,LED,Semi,
Related products AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203,
AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.

Description:
The Aluminum Nitride Sputtering Target, a vital component in the realm of thin film deposition, is indispensable for producing top-tier thin films used across a multitude of applications, including electronics and optics. Boasting exceptional thermal conductivity and chemical stability, this advanced material guarantees uniform film deposition, significantly enhancing the performance of thin film coatings. Its distinctive properties make it the material of choice for both researchers and manufacturers. Employing the Aluminum Nitride Sputtering Target, professionals can attain precise and dependable thin film deposition, fostering remarkable advancements in technology and innovation.

Application:
Ideal for use in Multilayer Films, Anti-reflection Films, Nano-hardening processes, and Glasses Coating.

Related Products

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
Inspection Equipment

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
Factory Equipment and Process

• Precision Vacuum Furnace
• High-Efficiency Sintering Furnace
• Robust Forging Machine
• Versatile Rolling Machine
• Precision Lathe
• Fine Grinder
• Advanced CNC Equipment
• Accurate Water Cutting System
• Precision Wire Cutting Technology
• High-Temperature Muffle Furnace
• Efficient Rotary Forging Machine
• Powerful Hydraulic Press
• Precision Leveling Machine
• High-Speed Punching Machine
• High-Quality Polishing Machine
• Durable Abrasive Belt Machine
• Ultrasonic Cleaning Machine
• Precision Cleaning Machine
High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
Product Application:

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
Company Information:

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
Our state-of-the-art factory spans an impressive 4000 square meters and is certified with the ISO9001:2015 quality management system and ISO14001:2015 environmental management system. We pride ourselves on our cutting-edge equipment and a robust team of skilled technicians. To guarantee unparalleled quality, our products undergo rigorous testing using carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, stiffness testers, and more. With the expertise of our professional technicians, skilled workers, and advanced machinery, we deliver products and services of exceptional quality. Our offerings are highly esteemed by customers worldwide, with exports to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Our commitment to quality, competitive pricing, prompt delivery, and excellent after-sales service sets us apart.
No matter the order volume or size, we are dedicated to fulfilling your requirements, a commitment we have upheld for years.
High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research

High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research


High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research
Packaging: Our standard export packaging includes a vacuum-sealed package inside, and an export carton or wooden case on the outside.
Shipping: We offer shipment services through FedEx, DHL, UPS, *** express, and more.
For orders with a gross weight ≤ 100KG, we use express shipping. For larger shipments ≥ 100KG, the shipping method will be discussed with you.
High Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific ResearchHigh Purity Aluminum Nitride Ceramic Sputtering Target for Custom Scientific Research

1. Are you a trading company or manufacturer?

Xinkang: We are a professional manufacturer with over 10 years of expertise in this field.


2. How long is your delivery time?

Xinkang: For regular sizes or samples, shipment can be made in 3-5 days. For batch quantities, it takes approximately 15 days.

3. Do you have a minimum order quantity (MOQ)?

Xinkang: No, we support sample orders.

4. What is your payment method?

Xinkang: We accept T/T in advance, PayPal, Western Union, and other methods.

Feel free to contact us at any time!

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