• High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
  • High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
  • High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
  • High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
  • High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
  • High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications

High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications

Application: Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting
Material: silicon Nitride Ceramics
Packaging: 1PC Vacuum Forming
Size: Customized
Delivery: 7-15days
Certificate: ISO9001:2015
Customization:
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Overview

Basic Info.

Model NO.
XK-SiC
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
D50.8mm D101.6mm support
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
Product Description

Changsha Xinkang Advanced Materials Co., Ltd.: Pioneering the Future of Sputtering Targets and Evaporation Materials

Product Name Silicon Carbide Sputtering tARGET
Available Purity 99.9%min
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size D50.8mm  D101.6mm support customized
Technolgy Sintering
Type of Bonding Indium, Elastomer
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Solar, Optical,Process,Decoration,LED,Semi,
Related products AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203,
AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.

Product Description: Our High Performance 99.5% Pure Silicon Carbide Sputtering Target is a premium-grade material widely acclaimed for its use in advanced thin film deposition processes. Renowned for its superior thermal conductivity, exceptionally high melting point, and remarkable chemical inertness, it is the ultimate choice for applications in the cutting-edge semiconductor industry.

Key Features: When utilizing our Silicon Carbide Sputtering Target, its unparalleled ability to deliver uniform and consistent film deposition across a variety of substrates stands out. This ensures the production of high-caliber thin films that not only meet but exceed your precise specifications.

Versatility: Whether engaged in pioneering research and development projects or high-scale industrial applications, our Silicon Carbide Sputtering Target is designed to help you accomplish meticulous and dependable results. Its adaptability and robustness make it an indispensable asset for a diverse array of sputtering applications.

Conclusion: In the realm of thin film deposition, our Silicon Carbide Sputtering Target is an essential material, offering unmatched performance and reliability. Its distinct properties establish it as the preferred choice for experts within the semiconductor industry.

Wide-Ranging Applications:
Our Silicon Carbide Sputtering Target excels in Multilayer Film Coatings, Anti-Reflection Films, Nano-Hardening Processes, and Glasses Coating Solutions.

Related Products

High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
Inspection Equipment

High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
Factory Equipment and Process

• High-Performance Vacuum Furnace: Ensuring optimal conditions for material refinement and enhancing the purity of our products.
• Advanced Sintering Furnace: Delivering superior structural integrity through precise sintering techniques.
• Robust Forging Machine: Empowering the creation of durable and high-strength components.
• Precision Rolling Machine: Guaranteeing exact thickness and consistency in rolled materials for unparalleled accuracy.
• Versatile Lathe: Enabling detailed shaping and customization to meet the highest standards.
• High-Accuracy Grinder: Providing flawless finishes and exact dimensions for every product.
• Cutting-Edge CNC Machine: Facilitating intricate designs and automated precision.
• Efficient Water Cutting Machine: Delivering swift and precise cuts with minimal material waste.
• Precise Wire Cutting Machine: Ensuring meticulous and sharp cuts for intricate designs.
• Reliable Muffle Furnace: Maintaining consistent temperatures for uniform processing.
• Innovative Rotary Forging Machine: Advancing the forging process with modern rotational techniques.
• High-Capacity Hydraulic Press: Offering powerful pressing capabilities for maximum material conformity.
• Efficient Leveling Machine: Achieving perfect flatness and balance in all processed materials.
• High-Speed Punching Machine: Providing fast and precise punching for high-volume production.
• Advanced Polishing Machine: Delivering lustrous finishes to enhance product appearance and performance.
• High-Precision Abrasive Belt Machine: Ensuring smooth and even surfaces for superior quality.
• Ultrasonic Cleaning Machine: Utilizing advanced ultrasonic waves for deep and thorough cleaning.
• Ultrasonic Cleaning Machine: Harnessing the power of ultrasonic technology for impeccable cleanliness.
High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
Product Application:

High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
Company Information:

High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
Our state-of-the-art factory, sprawling across an impressive 4000 square meters, is proudly certified with the ISO9001:2015 quality management system and the ISO14001:2015 environmental management system. Outfitted with cutting-edge technology and staffed by a team of highly skilled technicians, we ensure each product adheres to the utmost quality standards. Rigorous testing measures, including carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, and stiffness testers, guarantee unparalleled product excellence. Our professional technicians, adept workers, and advanced equipment enable us to deliver superior products and services. We have successfully penetrated markets in the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, earning accolades for exceptional quality, competitive pricing, timely delivery, and outstanding after-sales service.
Regardless of the order volume or size, we are steadfast in our commitment to meeting your requirements, a promise we have consistently upheld over the years.
High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications

High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications
Standard Export Packaging: Inside, products are vacuum-sealed; outside, they are protected by export cartons or wooden cases.
We offer shipments via FedEx, DHL, UPS, and other express services.
For shipments with a gross weight ≤100KG: For larger shipments ≥100KG, the shipping method will be discussed with you to ensure the most efficient delivery.
High Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating ApplicationsHigh Performance 99.5% Pure Silicon Carbide Sputtering Target for Precision Coating Applications

1. Are you a trading company or a manufacturer?

Xinkang: We are a professional manufacturer, specializing in this field for over 10 years.

2. How long is your delivery time?

XinKang: For regular sizes or samples, shipments can be made in 3-5 days. Bulk quantities are shipped in 15 days.

3. Do you have a minimum order quantity (MOQ)?

XinKang: No, we support sample orders with no minimum order quantity.

4. What is your payment method?

XinKang: We accept various payment methods including T/T in advance, PayPal, and Western Union.

We invite you to contact us at any time for further information or inquiries!

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