• High Purity Niv Magnetron Sputter Target
  • High Purity Niv Magnetron Sputter Target
  • High Purity Niv Magnetron Sputter Target
  • High Purity Niv Magnetron Sputter Target
  • High Purity Niv Magnetron Sputter Target
  • High Purity Niv Magnetron Sputter Target

High Purity Niv Magnetron Sputter Target

Type: Alloy Target
Shape: Round
Purity: 99.9%-99.9995%
Size: D50.8X3mm or as Your Request
OEM: Support
MOQ: 1PCS
Customization:
Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-NiV
Materials
Pure Metal Nickel + Vanadium
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Nickel Vanadium Sputtering Targets
Trademark
XinKang
Origin
China
HS Code
7505110000
Production Capacity
10000PCS/Month

Product Description

High Purity Niv Magnetron Sputter Target
Product Description

XinKang Factory Supply Top Ranking 99.9%-99.995% Purity NiV Magnetron Nickel Vanadium Sputtering Target NiV7wt% for PVD Coating
Name Metal Nickel Vanadium Alloy Sputtering Targets  (NiV7 Targets)
Material Nickel Vanadium Alloy Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5.
Size D50.8x3mm, 10x10x10mm,D3x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density Ni: 8.902g/cm3 ;  V:6.11g/cm3
Melting Point Ni: 1453°C; V: 1890°C.
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Nickel, a lustrous silver-white metal, boasts exceptional mechanical strength and ductility. It is insoluble in water and remarkably resistant to both acid and alkali. With high-temperature resilience, a melting point of 1455°C, and a boiling point of 2730°C, nickel's density stands at 8.902g/cm³. This versatile metal finds applications ranging from currency production to electroplating on other metals to prevent rust.

Our high-purity NiV sputtering targets are engineered to deliver superior performance for your PVD processes. These targets ensure your films achieve remarkable electrical conductivity while minimizing particle formation. Below is a typical certificate of analysis for our 3N5 high-purity NiV (93/7wt%) sputtering target.
Product Parameters

High Purity Niv Magnetron Sputter Target
Application:

Nickel boasts excellent plasticity, corrosion resistance, and magnetic properties. It is predominantly utilized in steel production, nickel-based alloys, electroplating, and battery manufacturing. Nickel's versatility extends to various military sectors, such as aircraft, radar systems, and civil machinery manufacturing, as well as the electroplating industry.

In the realm of integrated circuit fabrication, pure gold is conventionally used as an interconnect metal, deposited on a silicon wafer. However, gold tends to diffuse into the silicon, forming a high-resistance AuSi compound. This phenomenon significantly diminishes current density in the wiring, potentially leading to complete system failure.
To address this, it is recommended to introduce an adhesive layer between the gold thin film and silicon wafers. Typically, pure nickel serves this purpose. Nevertheless, diffusion between the nickel layer and the gold conductive layer necessitates a barrier layer to prevent unwanted interactions.
Vanadium, with its high melting point and capacity to handle large current densities, is ideal for depositing the barrier layer. Consequently, nickel sputtering targets, vanadium sputtering targets, and gold sputtering targets are all integral to integrated circuit fabrication.
Nickel vanadium (NiV) sputtering targets, containing 7% vanadium, merge the superior properties of both nickel and vanadium. This dual-functionality allows for the simultaneous achievement of adhesive and barrier layers. As a non-magnetic material, NiV alloy is particularly advantageous for magnetron sputtering processes.

Related Products:
High Purity Niv Magnetron Sputter TargetHigh Purity Niv Magnetron Sputter Target
Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a distinguished factory dedicated to the research, development, production, processing, sales, and service of premium metal materials. Our expansive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and an array of bespoke metal items. We meticulously manufacture our products in accordance with the standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS, and specific customer requirements. Our products have been extensively utilized across various industries including petrochemical, aerospace and aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive, and beyond. Located in the vibrant city of Changsha, Hunan, our state-of-the-art facility spans 4000 square meters and is certified under the ISO9001:2015 quality management system and the ISO14001:2015 environmental management system. Our factory is equipped with cutting-edge technology and manned by a team of expert technicians. To guarantee superior quality, we employ advanced testing equipment such as carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our highly skilled workforce and sophisticated equipment ensure the delivery of top-tier products and services. We are proud to have our products exported to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, where they are acclaimed for their exceptional quality, competitive pricing, timely delivery, and unparalleled after-sales service.
High Purity Niv Magnetron Sputter Target
Certifications

High Purity Niv Magnetron Sputter Target
Factory and Equippments

High Purity Niv Magnetron Sputter Target
Packaging & Shipping

High Purity Niv Magnetron Sputter Target
FAQ

1. Are you a trading company or a manufacturer?

Xinkang: We are a dedicated manufacturer with over a decade of experience in this specialized field.


2. How long is your delivery time?

XinKang: For standard sizes or samples, we can ship within 3-5 days. For larger orders, our delivery time is approximately 15 days.

3. Do you have a Minimum Order Quantity (MOQ)?

XinKang: No, we support orders of any size, including samples.

4. What are your accepted payment methods?

XinKang: We accept T/T in advance, PayPal, Western Union, and more.

Feel free to contact us anytime!

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now

You Might Also Like

Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001