• Niv7wt% Nickel Vanadium Alloy Sputter Target
  • Niv7wt% Nickel Vanadium Alloy Sputter Target
  • Niv7wt% Nickel Vanadium Alloy Sputter Target
  • Niv7wt% Nickel Vanadium Alloy Sputter Target
  • Niv7wt% Nickel Vanadium Alloy Sputter Target
  • Niv7wt% Nickel Vanadium Alloy Sputter Target

Niv7wt% Nickel Vanadium Alloy Sputter Target

Type: Alloy Target
Shape: Round
Purity: 99.9%-99.9995%
Size: D50.8X3mm or as Your Request
OEM: Support
MOQ: 1PCS
Customization:
Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-NiV
Materials
Pure Metal Nickel + Vanadium
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Nickel Vanadium Sputtering Targets
Trademark
XinKang
Origin
China
HS Code
7505110000
Production Capacity
10000PCS/Month

Product Description

Niv7wt% Nickel Vanadium Alloy Sputter Target
Product Description

XinKang Factory Supply Top-Ranking 99.9%-99.995% Purity NiV Magnetron Nickel Vanadium Sputtering Target NiV7wt% for PVD Coating
Name Metal Nickel Vanadium Alloy Sputtering Targets  (NiV7 Targets)
Material Nickel Vanadium Alloy Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5.
Size D50.8x3mm, 10x10x10mm,D3x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density Ni: 8.902g/cm3 ;  V:6.11g/cm3
Melting Point Ni: 1453°C; V: 1890°C.
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Nickel is a lustrous silver-white metal known for its excellent mechanical strength and ductility. It is insoluble in water and exhibits remarkable resistance to both acids and alkalis. Furthermore, it boasts high-temperature resistance with a melting point of 1455°C and a boiling point of 2730°C. With a density of 8.902g/cm³, nickel finds extensive use in coinage and can be electroplated onto other metals to provide rust prevention.

Our NiV sputtering targets are crafted with exceptional purity, offering unparalleled electrical conductivity and minimal particle formation during the PVD process. The following table showcases a typical certificate of analysis for our 3N5 high-purity NiV (93/7wt%) sputtering target, underscoring our commitment to quality and precision.
Product Parameters

Niv7wt% Nickel Vanadium Alloy Sputter Target
Application:

Nickel boasts exceptional plasticity, corrosion resistance, and magnetic properties. It is used prominently in steel production, nickel-based alloys, electroplating, and battery manufacturing. Additionally, it plays a critical role in military manufacturing sectors, including aircraft and radar production, as well as in diverse civil machinery manufacturing and the electroplating industry.

In the realm of integrated circuit fabrication, pure gold is typically employed as an interconnect metal deposited onto silicon wafers. However, gold tends to diffuse into the silicon, creating high-resistance AuSi compounds. This diffusion critically diminishes current density in the wiring, thereby jeopardizing the integrity of the entire wiring system.
To mitigate this issue, an adhesive layer is proposed between the gold film and silicon wafers. This adhesive layer is often composed of pure nickel. Nevertheless, diffusion also occurs between the nickel layer and the gold conductive layer, necessitating a barrier layer to prevent such diffusion.
Vanadium, with its high melting point and remarkable current density, is selected for the barrier layer deposition. Consequently, nickel sputtering targets, vanadium sputtering targets, and gold sputtering targets are all integral in the fabrication of integrated circuits.
Nickel vanadium (NiV) sputtering targets containing 7% vanadium combine the strengths of both nickel and vanadium. This allows for the formation of both adhesive and barrier layers simultaneously. As a non-magnetic material, the NiV alloy facilitates efficient magnetron sputtering processes.

Related Products:
Niv7wt% Nickel Vanadium Alloy Sputter TargetNiv7wt% Nickel Vanadium Alloy Sputter Target
Company Profile

Factory:
Founded in 2014, Changsha Xinkang Advanced Materials Co., Ltd is a professional factory specialized in the meticulous research, innovative development, precision production, expert processing, global sales, and dedicated service of high-quality metal materials. Our extensive product line includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powders, alloy powders, and other customized metal items. Each product is crafted according to the stringent standards of GB/T, ASTM/B ASME SB, AMS, DIN, JIS, and tailored customer requirements. These products are indispensable in diverse sectors including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery and instruments, metallurgy, automotive, and more. Our state-of-the-art factory, located in Changsha, Hunan, spans 4,000 square meters and boasts certifications from ISO9001:2015 for quality management and ISO14001:2015 for environmental management. Equipped with cutting-edge technology and staffed by a team of highly skilled technicians and workers, we ensure impeccable product quality through rigorous testing using carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, stiffness testers, and more. Our commitment to excellence has earned us a reputation for high-quality products, competitive pricing, punctual delivery, and exceptional after-sales service. Our products have gained acclaim and are in demand across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya.
Niv7wt% Nickel Vanadium Alloy Sputter Target
Certifications

Niv7wt% Nickel Vanadium Alloy Sputter Target
Factory and Equippments

Niv7wt% Nickel Vanadium Alloy Sputter Target
Packaging & Shipping

Niv7wt% Nickel Vanadium Alloy Sputter Target
FAQ

1.Are you trading company or manufacturer?

Xinkang: We are a professional manufacturer specializing in advanced materials for over a decade. Our expertise and experience have cemented our reputation in the industry.


2.How long is your delivery time?

Xinkang: For regular sizes or samples, we ensure shipment within 3-5 days. For bulk orders, our lead time extends to 15 days, ensuring meticulous quality control.

3.Do you have MOQ?

Xinkang: No, we support the needs of all clients and offer samples without any Minimum Order Quantity requirement.

4.What is your payment method?

Xinkang: We accept T/T in advance, PayPal, Western Union, and other convenient payment methods to suit our customers' preferences.

Welcome to contact us at any time!

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now

You Might Also Like

Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001