Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor

Product Details
Customization: Available
Type: Alloy Target
Shape: Round

360° Virtual Tour

Diamond Member Since 2018

Suppliers with verified business licenses

Audited Supplier

Audited by an independent third-party inspection agency

Management System Certification
ISO 9001, ISO 14001
  • Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
  • Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
  • Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
  • Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
  • Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
  • Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Find Similar Products
  • Overview
  • Product Description
  • Related Products
  • Inspection Equipment
  • Factory Equipment and Process
  • Product Application:
  • Company Information:
Overview

Basic Info.

Model NO.
XK-CuTi 02
Packaging
1PC Vacuum Forming
Purity
99.99%Min
Size
Customized
Delivery
7-15days
Certificate
ISO9001:2015
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
1′′ - 8′′, or as per your request
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Product Description

Sputtering target and evaporation materials manufacturer
Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor

Product Name Copper titanium sputtering target 
Available Purity 99.9%min,as you request
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size 1''- 8'',As per your request
Technolgy Melting
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Vaccum coating,Process,Decoration,LED,Semi,
Related products WNiFe, WTa, Mo,Ta, Nb, V, Zr, Hf, Ti, Ni, Cu etc

Copper titanium sputtering target is a crucial component in the field of thin film deposition. This specialized material plays a key role in the production of various electronic devices, such as semiconductors and solar panels. The high purity and precise composition of copper titanium sputtering target ensure optimal performance and efficiency in the deposition process.

One of the main advantages of using copper titanium sputtering target is its ability to provide a uniform and consistent coating on the substrate. This results in improved adhesion and durability of the thin film, making it ideal for applications that require high quality and reliability.

In addition, copper titanium sputtering target offers excellent thermal and electrical conductivity, making it suitable for a wide range of applications in the electronics industry. Its unique properties make it a preferred choice for manufacturers looking to enhance the performance of their products.

Overall, copper titanium sputtering target is a versatile and reliable material that plays a critical role in the advancement of technology. Its importance in thin film deposition cannot be understated, and its impact on various industries is undeniable.


Production process: smelting, loading and tool plating.
1. Purity: 99.9%min, 
2. Size: Dimensions are produced according to customer requirements

Application: It is mainly used in vacuum coating, surface treatment, hard coating, building glass coating, flat panel display, solar energy coating, optical coating and other fields.
Related Products

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor

 Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Inspection Equipment

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor

 
Factory Equipment and Process
• Vacuum furnace    • Sintering furnace    • Forging machine    • Rolling machine  • Lathe    • Grinder  • CNC
• Water cutting          • Wire cutting           • Muffle furnace        • Rotary forging    • Hydraulic press
• Leveling machine   • Punching machine  • Polishing machine  • Abrasive belt machine
• Ultrasonic cleaning machine

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for SemiconductorCopper Titanium Alloy Targets Cuti3wt% Sputtering Target for SemiconductorCopper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
 

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Product Application:

 

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Company Information:

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for SemiconductorOur factory covers an area of 4000 square meters. It has been certificated with IS09001:2015 quality management system and IS014001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore,India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Regardless of the order volume and size, we will try our best to meet your requirements and we are doing this for yearsCopper Titanium Alloy Targets Cuti3wt% Sputtering Target for SemiconductorCopper Titanium Alloy Targets Cuti3wt% Sputtering Target for SemiconductorCopper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor

Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor
Standard export packaging: Vacuum sealed package inside; export carton or wooden case outside
Shipment can be made by Fedex, DHL, UPS, TNT express etc.
for gross weight ≤100KG; For large shipment ≥100KG , shipping method will be discussed with you.
Copper Titanium Alloy Targets Cuti3wt% Sputtering Target for SemiconductorCopper Titanium Alloy Targets Cuti3wt% Sputtering Target for Semiconductor

1.Are you trading company or manufacturer?

 Xinkang:We are a professional manufacturer specialized in this field for over 10 years.

 
2.How long is your delivery time?

 XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity.

 

3.Do you have MOQ?

XinKang:No,We support samples.

 

4.What is your payment method?

 XinKang:T/T in advance, Paypal, Western Union and etc.

 

 

Welcome to contact us at any time!

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now
Contact Supplier