99.999% Pure Copper Metal Target for Magnetron Sputtering Applications

Product Details
Customization: Available
Type: Metal Target
Shape: Round

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  • 99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
  • 99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
  • 99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
  • 99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
  • 99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
  • 99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-Cu
Purity
99.9%-99.9999%
Size
D50.8X3mm or as Your Request
OEM
Support
MOQ
1PCS
Materials
Pure Metal Copper
Application
PVD Film Coating
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
Copper Crucible
Trademark
XinKang
Origin
China
HS Code
7402000090
Production Capacity
10000PCS/Month

Product Description

99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
Product Description

XinKang Factory Supply Top Ranking Wholesales 99.95% Purity Cu Copper Crucible: Premium Copper Melting Crucible for Induction Furnace Applications and Evaporation Materials Copper Target
Name Metal Copper Crucible (Cu Crucible)
Material Copper Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N,
Size D50.8x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 8.954g/cm3
Melting Point 1083°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

The copper sputtering target shares the remarkable properties of pure metal copper (Cu). Copper, denoted by the symbol Cu (derived from the Latin 'cuprum') and bearing the atomic number 29, is celebrated for its softness, malleability, and exceptional thermal and electrical conductivity. When freshly exposed, pure copper boasts a pinkish-orange hue. Its versatile applications include heat and electricity conduction, construction material, and constituent in various metal alloys. Our Copper Sputtering Target, crafted through advanced melting technology, finds widespread use in semiconductor industries, decorative coatings, and advanced packaging fields.

We specialize in producing copper sputtering targets with an impeccable purity range of 99.9% to an extraordinary 99.9999%, boasting an oxygen content as low as <1ppm. These targets are predominantly utilized for wiring and protective films in display and touch screens, solar light-absorbing layers, semiconductor wiring, and more. We manufacture both planar copper sputtering targets (up to the maximum G8.5 generation) and copper rotary targets, catering primarily to the touch screen industry. By overcoming the challenges of grain breakage through extensive deformation and meticulous twin growth control, we achieve a fine, uniform microstructure, ensuring reduced erosion rates and minimized particle formation sensitivity during sputtering.
Product Parameters

99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
Application:
Preparation Process of Copper Sputtering Target
Material Preparation: Electrolytic purification & electron beam melting → Chemical analysis → Forging → Rolling → Annealing → Metallographic inspection → Machining → Dimensional inspection → Cleaning → Final inspection → Packaging.

Copper Sputtering Target and Its Preparation Method
Our copper is meticulously purified from 99.95% to 99.99%, 99.999%, and up to an exceptional 99.9999% through advanced electrolysis and regional smelting techniques. With the highest purity level in China reaching an astounding 99.9999% (6N), our high-purity copper ingots undergo rigorous forging, rolling, and heat treatments. These processes effectively reduce crystal grain size and enhance density to meet the stringent requirements of sputtering copper targets. The deformation treated high-purity copper is then meticulously machined to achieve the precise dimensions and superior surface quality necessary for optimal performance in vacuum coating machines.

Other Alloy Forms of Copper Sputtering Target
We also offer a versatile range of alloy targets, including Tin-Copper, ***-Copper, Tungsten-Copper, Silver-Copper, Copper-Phosphorus, and Nickel-Copper.

Related Products:
99.999% Pure Copper Metal Target for Magnetron Sputtering Applications99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

99.999% Pure Copper Metal Target for Magnetron Sputtering Applications99.999% Pure Copper Metal Target for Magnetron Sputtering Applications99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
Company Profile

Factory:
Since its inception in 2014, Changsha XinKang Advanced Materials Co., Ltd has established itself as a premier factory specializing in the meticulous research, development, production, processing, sales, and service of high-quality metal materials. Our diverse product range includes Metal Elements, Alloys, Metal Sputtering Targets, Alloy Targets, Ceramic Targets, Evaporation Materials, Metal Powder, Alloy Powder, and bespoke metal items. We strictly adhere to international standards such as GB/T, ASTM/B ASME SB, AMS, DIN, JIS, and cater to specific customer requirements. Our products are integral to a myriad of industries including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instruments, metallurgy, and automotive sectors. Nestled in Changsha, Hunan, our expansive 4000 square meter factory is ISO9001:2015 and ISO14001:2015 certified, embodying our commitment to quality and environmental stewardship. Our state-of-the-art facility boasts high-tech equipment and a dedicated team of skilled technicians. We ensure premium quality through rigorous testing with advanced instruments such as carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our expertise, precision, and cutting-edge technology empower us to deliver exceptional products and services. The excellence of our offerings has captured a global market, with exports reaching the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Our customers consistently commend us for our superior quality, competitive pricing, timely deliveries, and stellar after-sales support.
99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
Certifications

99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
Factory and Equippments

99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
Packaging & Shipping

99.999% Pure Copper Metal Target for Magnetron Sputtering Applications
FAQ

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