• High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
  • High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
  • High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
  • High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
  • High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
  • High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target

High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target

Application: Medical, Industrial, Electronics, Aviation, PVD Film Coating
Purity: 99.9%-99.9995%
Size: 1inch 2inch or as Your Request
OEM: Support
MOQ: 1PC
Materials: Pure Metal Aluminum
Customization:
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  • Overview
  • Product Description
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Overview

Basic Info.

Model NO.
XK-Al2O3
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
7606910000
Production Capacity
10000PCS/Month

Product Description

High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
Product Description
 
XinKang Factory Supply Top Ranking Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
Name Metal Alumina Ceramic Targets (Al2O3 Targets)
Material Aluminum Metal Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color Metallic Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.7g/cm3
Melting Point 660°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)
 
Description:

Aluminum is a silvery white, lightweight metal celebrated for its exceptional malleability. Versatile in form, it is molded into rods, sheets, foil, powders, strips, and filaments. A natural oxide film forms in moist air, providing robust corrosion resistance. When heated, aluminum powder and foil burn intensely, emitting a dazzling white flame. Soluble in dilute acids and alkalis, yet water-insoluble, aluminum features a relative density of 2.70, a melting point of 660 ° C, and a boiling point of 2327 ° C. Its unique properties-lightweight, excellent electrical and thermal conductivity, high reflectivity, and oxidation resistance-make it an indispensable material across a wide array of industries.

Aluminum Pellets inherit the remarkable properties of pure metal aluminum. As a chemical element symbolized by Al and denoted by the atomic number 13, aluminum is a silvery-white, soft, ductile metal within the boron group. Known for its low density and superior resistance to corrosion via passivation, aluminum is non-magnetic and extremely versatile.

Aluminum and its countless alloys hold paramount importance in the aerospace industry and are critical to transportation and construction sectors, including building facades and window frames. Pure aluminum grades such as 3N8-4N8 are indispensable for rolling electrolytic capacitor aluminum foil, lighting fixtures, and data storage solutions. Ultra-pure grades like 5N-6N are crucial for manufacturing semiconductor devices, optoelectronic storage media, superconducting cable materials, and in conducting advanced scientific research in space exploration.

Our high-purity sputtering targets deliver unparalleled advantages, ensuring your films achieve superior electrical conductivity and minimal particle formation during the PVD process. Below is a typical Certificate of Analysis for our 5N aluminum sputtering target, highlighting its exceptional purity standard and outstanding performance characteristics.
Product Parameters

High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
Application:

Application: This versatile material is ideal for a broad range of sputtering techniques including DC two-pole, three-pole, four-stage, RF, target-oriented, ion beam, and magnetron sputtering. It is perfect for applying reflective, conductive, semiconductor, capacitor, decorative, and protective films. Furthermore, it is indispensable for integrated circuits and display technologies, making aluminum target material the premier choice when functional film requirements are a priority.

Aluminum is derived by extracting Al2O3 from bauxite and electrolyzing it in molten cryolite, achieving a purity level generally above 99%. However, this purity is insufficient for producing high-quality aluminum targets. The most critical requirement is exceptional purity. The high-purity aluminum used in these targets is manufactured through advanced techniques like segregation, three-layer electrolysis, or combined zone smelting, resulting in a significantly higher price compared to the industrial pure aluminum (99.7%). In China, the highest obtainable purity reaches up to 99.9999% (6N). Utilizing these high-purity aluminum ingots as raw materials, processes like forging, rolling, and heat treatment refine the grain structure and enhance density to meet the exacting standards of sputtering aluminum targets. Post-deformation, the aluminum undergoes precise mechanical processing. The production of aluminum targets demands high precision and superior surface quality, enabling customization to the target sizes required by vacuum coating machines.

Other alloy forms of aluminum sputtering target
Include: Aluminum-Silicon, Aluminum-Copper, Aluminum-Magnesium, Aluminum-Zinc, and Aluminum-Rare Earth alloys.

Related Products:
High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic TargetHigh Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc
 
Company Profile
 
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd. stands as a beacon of innovation and excellence. As a specialized factory, we excel in the research, development, production, processing, sales, and service of top-tier metal materials. Our diverse product range includes Metal Elements, Alloys, Metal Sputtering Targets, Alloy Targets, Ceramic Targets, Evaporation Materials, Metal Powders, Alloy Powders, and a variety of customized metal items. Adhering strictly to standards such as GB/T, ASTM/B ASME SB, AMS, DIN, JIS, and other customer-specific requirements, our products have found applications across numerous industries. These sectors include Petrochemical, Aerospace, Aviation, Shipbuilding, Energy, Medical, Military, Electronics, Environmental Protection, Machinery, Instruments, Metallurgy, and Automotive fields. Nestled in Changsha, Hunan, our sprawling 4000-square-meter facility is ISO9001:2015 and ISO14001:2015 certified, underscoring our commitment to quality and environmental management. Equipped with state-of-the-art technology and a cadre of skilled technicians, we ensure unparalleled product excellence through rigorous testing using advanced instruments such as carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers. Our dedication to quality, competitive pricing, prompt delivery, and exceptional after-sales service has earned us the trust and appreciation of customers worldwide. Our products are exported to the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, consistently meeting and exceeding customer expectations.
High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
Certifications

High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
Factory and Equippments

High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
Packaging & Shipping

High Purity Alumina Sputtering Target 99.99% Al2O3 Aluminum Oxide Ceramic Target
FAQ
 

1. Are you a trading company or a manufacturer?

Xinkang: We are a dedicated manufacturer with over a decade of expertise in the field.

2. How long is your delivery time?

Xinkang: For regular-sized items or samples, shipment is typically within 3-5 days. For batch quantities, please allow approximately 15 days for delivery.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: No, we support sample orders with no MOQ requirement.

4. What are your payment methods?

Xinkang: We accept payments via T/T in advance, PayPal, Western Union, and more.

Feel free to contact us anytime for further information!

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