| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Shape: | Square |
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Our Cobalt Tantalum Zirconium Sputtering Target stands as a pinnacle of innovation with its advanced melting technology, specially designed for the magnetic data storage industry. This exemplary product boasts an impressive purity level of up to 3N5, coupled with a uniform grain size and reduced oxygen content. These features ensure a steady erosion rate for end-users and facilitate the creation of high-purity, homogeneous thin film coatings during the PVD (Physical Vapor Deposition) process, ensuring unmatched efficiency and performance.
Distinctive Features
Exquisite Chemical Composition: Available in two specific ratios - CoTaZr 90/5/5 at% and CoTaZr 91.5/4.5/4 at%, catering to diverse application needs with precision.
Precision Segregation of Weight: Expertly controlled to +/-0.5 wt%, ensuring reliability and consistency across applications.
Remarkable Purity: Offering an exceptional purity level of 3N5, ideal for high-performance applications demanding superior material quality.
Cutting-edge Production Technology: Utilizes sophisticated melting techniques to achieve optimal performance and material characteristics.
Versatile Shapes: Available in planar target configurations, tailored for versatile and efficient application in various technological domains.
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