| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Shape: | Square |
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Introducing the state-of-the-art Cobalt Tantalum Zirconium Sputtering Target, meticulously crafted through advanced melting technology. Primarily utilized in the magnetic data storage industry, this target boasts an impeccable purity of up to 3N5. With its consistently uniform grain size and reduced oxygen content, end users can achieve seamless and constant erosion rates. This results in a high-purity, homogeneous thin film coating that impeccably enhances the PVD process for unparalleled performance.
Key Features
Chemical Composition: Available in compositions of CoTaZr 90/5/5at% and CoTaZr 91.5/4.5/4at%, ensuring optimal versatility for various applications.
Precision Segregation: Weight variance kept within +/-0.5wt% to ensure consistent quality and performance.
Purity Assurance: Available Purity: 3N5, guaranteeing exceptional quality and reliability.
Innovative Production Technology: Expertly produced using advanced melting techniques, ensuring superior material integrity.
Versatile Shapes: Available in planar target shapes, designed for maximum adaptability and efficiency.
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