Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target

Product Details
Customization: Available
Application: Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting
Material: Other

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Management System Certification
ISO 9001, ISO 14001
  • Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
  • Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
  • Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
  • Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
  • Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
  • Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
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  • Overview
  • Product Description
  • Related Products
  • Inspection Equipment
  • Factory Equipment and Process
  • Product Application:
  • Company Information:
Overview

Basic Info.

Model NO.
XK-NiO 01
Packaging
1PC Vacuum Forming
Size
Customized
Delivery
7-15days
Certificate
ISO9001:2015
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
D50.8mm D101.6mm support
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
Product Description

Leading Manufacturer of Sputtering Target and Evaporation Materials

Product Name NiO Ceramic Targets
Available Purity 99.9%min
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size D50.8mm  D101.6mm support customized
Technolgy Sintering
Type of Bonding Indium, Elastomer
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Solar, Optical,Process,Decoration,LED,Semi,
Related products AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203,
AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.

Description: NiO Ceramic Targets are indispensable in various industries due to their unparalleled high purity and exceptional thermal stability. These targets play a critical role in thin film deposition processes, prominently featured in semiconductor manufacturing, optical coating, and solar cell production.

The standout feature of NiO Ceramic Targets is their capability to produce thin films with pinpoint precision in thickness and uniformity, ensuring superior quality of the final products. Their exceptional thermal stability ensures consistent performance over prolonged usage, making them an economically advantageous option for industrial applications.

Beyond their technical prowess, NiO Ceramic Targets are also a green choice, devoid of harmful substances and fully recyclable post-use. This makes them an ideal sustainable solution for companies committed to reducing their environmental footprint.

In essence, NiO Ceramic Targets serve as a versatile and dependable solution for industries that demand exacting thin film deposition. Their unrivaled high purity, outstanding thermal stability, and eco-friendly attributes position them as the premier choice for manufacturers aiming for impeccable quality.

Application:
Multilayer Film Coatings; Anti-Reflection Films; Nano-Hardening Processes; Glass Coating Solutions.

Related Products

Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
Inspection Equipment

Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
Factory Equipment and Process

• High-Performance Vacuum Furnace: Our state-of-the-art vacuum furnace ensures exceptional performance, delivering unparalleled results for high-purity coatings. Experience next-level engineering and reliability in every application.
• Advanced Sintering Furnace: Experience the precision and reliability of our advanced sintering furnace, designed for optimal material densification and uniformity. This furnace is engineered to deliver unmatched consistency in every cycle.
• Robust Forging Machine: Our robust forging machine offers unbeatable strength and durability, perfect for crafting high-quality materials with precision. Built to last, this machine guarantees superior performance in all forging tasks.
• Precision Rolling Machine: Achieve perfect dimensions and flawless finishes with our top-tier precision rolling machine, designed for consistent, high-quality output. Precision and reliability are at the core of this advanced machine.
• Versatile Lathe: The versatile lathe integrates advanced features to accommodate a wide range of machining tasks with exceptional accuracy. Adaptability and precision make this lathe indispensable for any production line.
• High-Accuracy Grinder: Our high-accuracy grinder ensures precise surface finishes, catering to the most demanding standards in material processing. Delivering excellence in every smooth, refined finish.
• Cutting-Edge CNC Machine: Harness cutting-edge technology with our CNC machine, delivering precision and efficiency for complex machining projects. Achieve superior accuracy and productivity in all your CNC tasks.
• Efficient Water Cutting Machine: Benefit from the efficiency and precision of our water cutting machine, ideal for cutting a variety of materials with minimal waste. Perfect for high-precision, eco-friendly cutting solutions.
• Precise Wire Cutting Machine: Our wire cutting machine guarantees exceptional precision, making it perfect for intricate and detailed material cutting. Expect accuracy and perfection with every cut.
• Reliable Muffle Furnace: Depend on our muffle furnace for consistent heat treatment, ensuring uniform results and enhanced material properties. Built for reliability, it delivers outstanding performance.
• Innovative Rotary Forging Machine: The innovative rotary forging machine delivers superior forging capabilities, enhancing material strength and integrity. Revolutionize your forging process with this advanced machine.
• High-Capacity Hydraulic Press: Our hydraulic press offers high capacity and reliability, making it ideal for heavy-duty material forming tasks. Delivering power and precision for demanding applications.
• Efficient Leveling Machine: Achieve perfect flatness and consistency with our efficient leveling machine, essential for high-quality material processing. Designed for optimal performance and accuracy.
• High-Speed Punching Machine: Experience fast and accurate punching with our high-speed machine, designed for high throughput and precision. Enhance your productivity with this reliable, high-performance machine.
• Advanced Polishing Machine: Our advanced polishing machine ensures a mirror-like finish, providing the ultimate surface quality for your materials. Experience unmatched polishing excellence.
• High-Precision Abrasive Belt Machine: The high-precision abrasive belt machine offers exceptional surface refinement, ideal for detailed finishing tasks. Achieve perfect finishes with high-efficiency processing.
• Ultrasonic Cleaning Machine: Ensure thorough and efficient cleaning with our ultrasonic cleaning machine, perfect for delicate and complex components. Superior cleaning performance for all intricate materials.
• Ultrasonic Cleaning Machine: Ensure thorough and efficient cleaning with our ultrasonic cleaning machine, perfect for delicate and complex components. Superior cleaning performance for all intricate materials.
Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
Product Application:

Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
Company Information:

Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
Our expansive 4000-square-meter factory is a beacon of excellence, proudly certified with both the ISO9001:2015 quality management system and the ISO14001:2015 environmental management system. Outfitted with state-of-the-art technology and a team of highly skilled technicians, we guarantee that each product adheres to the utmost standards of quality. Through rigorous testing with carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, and stiffness testers, we ensure unparalleled excellence. Our professional technicians, adept workers, and advanced equipment empower us to deliver exceptional products and services. Our premium offerings have penetrated markets in the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, garnering acclaim for their superior quality, competitive pricing, prompt delivery, and excellent after-sales service.
Regardless of your order's volume or size, our unwavering commitment to meeting your requirements has been a cornerstone of our service over the years.
Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target
Standard Export Packaging: Inside, vacuum-sealed packaging; outside, export carton or wooden case.
We facilitate shipments through FedEx, DHL, UPS, and other express delivery services.
For shipments with a gross weight ≤100KG, we provide detailed arrangements. For larger shipments ≥100KG, the shipping method will be coordinated with you.
Nio Sputtering Materials for Thin Film Deposition and High Purity Ceramic TargetNio Sputtering Materials for Thin Film Deposition and High Purity Ceramic Target

1. Are you a trading company or manufacturer?

Xinkang: We are a dedicated manufacturer with over 10 years of specialized experience in this field.

2. How long is your delivery time?

Xinkang: For regular sizes or samples, shipments can be made in 3-5 days; for bulk quantities, the delivery time is 15 days.

3. Do you have a minimum order quantity (MOQ)?

Xinkang: No, we support sample orders.

4. What is your payment method?

Xinkang: We accept T/T in advance, PayPal, Western Union, and more.

We warmly welcome you to contact us at any time!

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