Customized Aln Ceramic Sputtering Substrate

• Customization: Available
• Type: Ceramic Target
• Shape: Round
• Certification: TUV, ISO, CE
• Dimension: Customized
• Purity: 99.5%
• Application: PVD Coating
• Chemical Composition: 99.5% Aln
• MOQ: 1 PC
• Packing: Vacuum Sealed
• Certificated: ISO 9001, 14001
• Delivery: 7-15 Days
• Surface: Smooth
• Material: Aluminum Nitride
• Transport Package: Vacuum Sealed Package
• Specification: customized
• Trademark: XINKANG
• Origin: Changsha, China
• HS Code: 8486909900
• Production Capacity: 5000pieces/Year

Product Description

Product Name: High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition

Category: Target Material

Keywords: Aluminum nitride sputtering target, High purity aluminum nitride, Thin film deposition material, Semiconductor industry target, AlN sputter target, Ceramic sputtering material, Aluminum nitride coating, PVD coating material, Sputter deposition target, AlN thin film substrate, AlN sputtering target material

Description: Our high-purity 99.5% aluminum nitride sputtering target is meticulously crafted for optimal performance in thin film deposition within the semiconductor industry. This advanced ceramic sputtering material guarantees unparalleled quality in PVD coating processes. Boasting exceptional purity, our aluminum nitride sputtering target delivers outstanding conductivity and thermal stability, making it the perfect choice for sputter deposition applications. The AlN thin film substrate created from our high-grade sputtering target material showcases remarkable properties, significantly boosting the efficiency of thin film coatings. Rely on our aluminum nitride sputtering target for precise and dependable outcomes in all your thin film deposition endeavors.