• 99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
  • 99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
  • 99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
  • 99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
  • 99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
  • 99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research

Application: Aerospace, Ceramic Decorations, Electronics, Medical, Refractory, Semiconductor, Optical Caoting
Flexural Strength: Dont Know
Purity: 99.99%Min
Type: Zirconium Dioxide Tables
Packaging: 1PC Vacuum Forming
Size: Customized
Customization:
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Overview

Basic Info.

Model NO.
XK-AlN 03
Delivery
7-15days
Certificate
ISO9001:2015
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
D50.8mm D101.6mm support
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
Product Description

Sputtering target and evaporation materials manufacturer

Product Name Aluminum Nitride Sputtering Target  
Available Purity 99.9%min
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size D50.8mm  D101.6mm support customized
Technolgy Sintering
Type of Bonding Indium, Elastomer
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Solar, Optical,Process,Decoration,LED,Semi,
Related products AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203,
AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc. CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
 

Description:
Aluminum Nitride Sputtering Target is a crucial component in the field of thin film deposition. This material plays a key role in the production of high-quality thin films for various applications, such as electronics and optics. With its excellent thermal conductivity and chemical stability, Aluminum Nitride Sputtering Target ensures uniform film deposition and enhances the overall performance of thin film coatings. Its unique properties make it a preferred choice for researchers and manufacturers alike. By utilizing Aluminum Nitride Sputtering Target, professionals can achieve precise and reliable thin film deposition, leading to advancements in technology and innovation.

Application:
Multilayer film; Anti-reflection film; Nano-hardening; Glasses coating.

Related Products

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research

 99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
Inspection Equipment

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research

 
Factory Equipment and Process
• Vacuum furnace    • Sintering furnace    • Forging machine    • Rolling machine  • Lathe    • Grinder  • CNC
• Water cutting          • Wire cutting           • Muffle furnace        • Rotary forging    • Hydraulic press
• Leveling machine   • Punching machine  • Polishing machine  • Abrasive belt machine
• Ultrasonic cleaning machine

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
 

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
Product Application:

 

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
Company Information:

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific ResearchOur factory covers an area of 4000 square meters. It has been certificated with IS09001:2015 quality management system and IS014001:2015 environmental management system. At present, the company is well equipped with Hi-tech equipment and a huge contingent of technicians. To ensure the excellent quality, we test the products with carbon sulfur instrument, spectrometer, flaw detector, cupping machine, stiffness tester and so on. Professional technician, skilled workers and advanced equipment enable us to present products and services with high quality. Our products have been exported to USA, Europe, Middle East, Japan, Korea, Singapore,India and Kenya, it's good quality, competitive price, timely delivery and best after-sales service are highly appreciated by our customers.
Regardless of the order volume and size, we will try our best to meet your requirements and we are doing this for years99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research

99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research
Standard export packaging: Vacuum sealed package inside; export carton or wooden case outside
Shipment can be made by Fedex, DHL, UPS, TNT express etc.
for gross weight ≤100KG; For large shipment ≥100KG , shipping method will be discussed with you.
99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research

1.Are you trading company or manufacturer?

 Xinkang:We are a professional manufacturer specialized in this field for over 10 years.

 
2.How long is your delivery time?

 XinKang:Shipment can be made in 3-5days for those regular size,or samples, and 15 days for batch quantity.

 

3.Do you have MOQ?

XinKang:No,We support samples.

 

4.What is your payment method?

 XinKang:T/T in advance, Paypal, Western Union and etc.

 

 

Welcome to contact us at any time!

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Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001