| Customization: | Available |
|---|---|
| Type: | Ceramic Target |
| Shape: | Round |
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
Product Name: High Purity RuO2 Sputtering Target
Category: Target Material
Keywords: Thin Film Coating Materials, RuO2 sputtering target, High purity ruthenium oxide, Thin film deposition material, Sputter coating applications, Semiconductor industry target, Optical coating material, Ceramic sputtering target, PVD coating material, Ruthenium dioxide target, Customized sputter target
Description: Enhance your thin film deposition processes with our premium High Purity RuO2 Sputtering Target. Perfectly suited for a variety of sputter coating applications within the semiconductor and optical industries, this target stands out due to its superior quality and durability. Crafted from high purity ruthenium oxide, this ceramic sputtering target promises exceptional performance and longevity. As a reliable PVD coating material, it ensures precise and uniform film deposition. Tailored to meet your unique specifications, our RuO2 sputtering target is the ultimate solution for your thin film coating requirements. Trust in the unrivaled quality and efficiency of our product to elevate your operations to unprecedented heights.
){kind=link}