| Customization: | Available |
|---|---|
| Type: | Ceramic Target |
| Shape: | Round |
Suppliers with verified business licenses
Audited Supplier Audited by an independent third-party inspection agency
Product Name: High Purity Tantalum Nitride Sputtering Target TaN
Category: Target Material
Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor deposition
Description: Elevate your thin film technology with our High Purity Tantalum Nitride Sputtering Target. Specifically designed for the semiconductor industry, this ceramic target material is ideal for PVD coating applications. Featuring an exceptional high purity composition, our tantalum nitride target guarantees superior performance in vacuum deposition processes. Achieve precise, uniform, and reliable thin film deposition with confidence, thanks to the outstanding quality of this sputtering target. Enhance the efficiency, productivity, and effectiveness of your PVD coating operations with our tantalum nitride sputtering target. Commit to excellence and invest in top-tier solutions for your thin film technology requirements.
){kind=link}