High Purity Planar & Rotary Shaped Pure Tantalum Sputtering Target for PVD Coating

• Material: Tantalum
• Application: PVD Process
• Shape: Planar, Rotary
• Size: Accept Custom
• Color: Metal Color
• Purity: High Purity
• Model NO.: Ta sputtering target
• Grade: Industrial Grade
• Main Market: Globle
• Chemical Composition: 99.95% Tantalum
• Appearance: Shinny
• Name: Tantalum Sputtering Target
• Type: Square Target
• Product Name: Ta Sputtering Target
• Certificate: ISO9001
• Transport Package: Vacuum Sealed Package Inside
• Trademark: XK
• Origin: Hunan, China
• Production Capacity: 1000 Piece/Pieces Per Month

Product Description

Product Description

                                               Thin film coating materials 99.9% Tantalum(Ta) sputtering target
XK is a professional producer of Tantalum sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to the special forming processes we used, our Tantalum sputtering targets possess higher density, smaller average particle size as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Tantalum layers.

Product Name	Tantalum(Ta)sputtering target
Available Purity(%)	99.9(3N), 99.95(3N5),99.99(4N)
Shape	Planar, rotary
Color	Gray
Size	as your request
Melting point()	2996
Density(g/cm³)	16.654
Boiling point()	5425
Technology	Vacuum Melting, Patented thermo-mechanical process and machine work
Application	Semiconductors, Micro-Electronics etc.