| Customization: | Available |
|---|---|
| Material: | Tantalum |
| Application: | PVD Process |
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Thin film coating materials 99.9% Tantalum(Ta) sputtering target
XK is a professional producer of Tantalum sputtering targets with various shapes and purity, which are mainly applied to semi-conductive & micro-electronics industry. Thanks to the special forming processes we used, our Tantalum sputtering targets possess higher density, smaller average particle size as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Tantalum layers.
|
Product Name |
Tantalum(Ta)sputtering target |
|
Available Purity(%) |
99.9(3N), 99.95(3N5),99.99(4N) |
|
Shape |
Planar, rotary |
|
Color
|
Gray
|
|
Size |
as your request |
|
Melting point()
|
2996
|
|
Density(g/cm³)
|
16.654 |
|
Boiling point()
|
5425
|
|
Technology
|
Vacuum Melting, Patented thermo-mechanical process and machine work
|
|
Application
|
Semiconductors, Micro-Electronics etc.
|
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