High Purity Tantalum Nitride Sputtering Target Tan Target Material for PVD Coating
| Customization: | Available |
|---|---|
| Type: | Ceramic Target |
| Shape: | Round |
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Basic Info.
- Certification
- TUV, ISO, CE
- Dimension
- Customized
- Purity
- 99.5%
- Application
- PVD Coating
- Chemical Composition
- 99.5% Tan
- MOQ
- 1 PC
- Packing
- Vacuum Sealed
- Certificated
- ISO 9001, 14001
- Delivery
- 7-15 Days
- Surface
- Smooth
- Material
- Tantalum Nitride
- Transport Package
- Vacuum Sealed Package
- Specification
- customized
- Trademark
- XINKANG
- Origin
- Changsha, China
- HS Code
- 8486909900
- Production Capacity
- 5000pieces/Year
Product Description
Product Name: High Purity Tantalum Nitride Sputtering Target TaN
Category: Target Material
Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor deposition
Description: Elevate your thin film technology with our High Purity Tantalum Nitride Sputtering Target. Specifically designed for the semiconductor industry, this ceramic target material is ideal for PVD coating applications. With its high purity composition, our tantalum nitride target ensures superior performance in vacuum deposition processes. Achieve precise and uniform thin film deposition with ease, thanks to the exceptional quality of this sputtering target. Enhance the efficiency and effectiveness of your PVD coating operations with our tantalum nitride sputtering target. Invest in the best for your thin film technology needs.
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