High Purity Zn Metal Zinc Plate Sputtering Target for PVD Machine

• Customization: Available
• Type: Metal Target
• Shape: Rectangle
• Model NO.: XK-Zn
• Certification: TUV, ISO, CE
• Purity: 99.99%
• Size: Customized
• MOQ: 1 PC
• Free Sample: Accept
• Packing: Wooden Case
• Certificate: Provide for Each Target
• Transport: by Air
• Delivery: 5-10 Days
• Transport Package: Vacuum Sealed
• Specification: customized
• Trademark: no
• Origin: China
• HS Code: 8486909900
• Production Capacity: 1000 PCS/Year

Product Description

                  Thin film coating materials zinc/Zn sputtering target 

Zinc Sputtering Target is produced by melting technology, normally used for depositing Znic oxide thin film, which can be luminescent film of LED and OLED products, or transparent conducting film of OLED products and anti-reflection film of thin-film solar cells. With up to 4N purity and special annealing treatment, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.
 

Product:	zinc/Zn sputtering target
Purity:	99.99%
Size:	customized
Shape:	Planar and rotary
Packing:	Vacumm sealed, wooden case