| Customization: | Available |
|---|---|
| Type: | Alloy Target |
| Shape: | Square |
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The Cobalt Tantalum Zirconium Sputtering Target, a marvel crafted through advanced melting technology, is primarily utilized in the magnetic data storage sector. With an impressive purity level reaching up to 3N5 and a consistency in grain size, this target ensures end-users achieve steady erosion rates, alongside a high-purity, homogeneous thin film coating during the PVD process. Its low oxygen content further enhances its suitability for critical applications, making it an indispensable component in elite data storage solutions.
Features
Chemical Composition: Offered in precise formulations, CoTaZr at 90/5/5at% and CoTaZr at 91.5/4.5/4at%, these compositions are designed to meet the demanding needs of high-performance applications.
Segregation of weight: With an exceptional precision of +/-0.5wt%, our products guarantee unparalleled consistency and reliability.
Available Purity: The target boasts an impressive 3N5 purity, ensuring optimal performance in every application.
Production Technology: Masterfully engineered using state-of-the-art melting processes, which bring forth superior quality and precision.
Shapes: Available in planar target configurations, designed to meet diverse application requirements with precision and efficiency.
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