XinKang Factory proudly supplies premier top-ranking 99.9% pure LaB6 ceramic target, known as Lanthanum Hexaborid Target, optimized for PVD Coating applications.
Description:Lanthanum Hexaboride (LaB6) exhibits metallic conductivity due to the stabilization of its B6 octahedral network by La's valence electrons. Its surface plasmon resonance absorption around 1000nm positions it as a superior infrared blocking material compared to ITO (indium tin oxide), especially in the near-infrared region. LaB6 features strong covalent B-B bonds forming a tight network, granting it low volatility, low work function, high melting point, high strength, and high stability. These attributes render it essential for field emission materials in advanced instruments like electron microscope filaments. With a density of 4.7g/cm^3, LaB6 is among the most stable compounds in the B-La system, surpassing others like LaB2 and LaB4.
Lanthanum Hexaborid
Sputtering Target;
Purity: 99.9%;
Production Method: Cold Press Sintering;
Available Dimensions:
Circular Target: Diameter = 3 mm;
Rectangular Target: Length = 3 mm;
Rotary Target: L 4000 x Wall Thickness 15mm;
Minimal Order Quantity: 1 piece;
Type of Bonding: Indium, Elastomer;
Application Field: Thin-film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
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Co2O3 Sputtering Target
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ITO Sputtering Target
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NiO Sputtering Target - Precision-engineered for optimal performance, our high-purity Nickel Oxide (NiO) sputtering target promises exceptional quality and reliability for your thin film deposition applications.
MoO3 Sputtering Target - Our premium Molybdenum Trioxide (MoO3) sputtering target is meticulously crafted to ensure high efficiency in producing uniform thin films, designed to meet and exceed your research and production needs.
WO3 Sputtering Target - Crafted with precision, our Tungsten Trioxide (WO3) sputtering target offers superior quality and consistent results, perfect for achieving high-performance coatings in various applications.
LiFePO4 Sputtering Target - Our high-purity Lithium Iron Phosphate (LiFePO4) sputtering target is engineered for exceptional durability and performance, ideal for energy storage and battery-related thin film applications.
ZnS Sputtering Target - Experience unparalleled quality with our Zinc Sulfide (ZnS) sputtering target, designed for high efficiency and consistent deposition in optical and electronic applications.
Bi2Te3 Sputtering Target - Our Bismuth Telluride (Bi2Te3) sputtering target is finely manufactured to ensure optimal performance and reliability for thermoelectric and electronic thin film applications.
Ga2O3 Sputtering Target - High-purity Gallium Oxide (Ga2O3) sputtering target engineered for excellence, ensuring uniform thin films with superior quality for advanced electronic and optical applications.
In2O3 Sputtering Target - Our Indium Oxide (In2O3) sputtering target offers outstanding purity and consistency, perfect for transparent conductive films and other specialized thin film applications.
Ta2O5 Sputtering Target - Tantalum Pentoxide (Ta2O5) sputtering target designed for high-performance and uniform deposition, ideal for dielectric coatings and advanced electronic components.
Nb2O5 Sputtering Target - Our Niobium Pentoxide (Nb2O5) sputtering target is crafted with the highest precision for excellent quality and reliable performance in dielectric and optical thin film applications.
Lanthanum Hexaborid Sputtering Target
/ LaB6 Ceramic Targets COA (Certificate of Analysis)
Applications:
1. Enhance and preserve the surface properties of various materials, including their hardness, wear resistance, corrosion resistance, and more;
2. Innovatively develop new materials or significantly boost the performance of existing ones, such as in solar cells, LEDs, flat panel displays, and other advanced technologies;
3. Crucial in the manufacturing of electronic components, including transistors, integrated circuits, and similar devices;
4. Essential for the creation of superconductors, optical films, sensors, and a diverse range of high-tech materials.
Related Products:
Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd. stands as a premier powerhouse in the realm of high-quality metal materials. Specializing in the research, development, production, processing, sales, and service of an expansive range of materials, we offer metal elements, alloys, sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and bespoke metal items tailored to your unique needs. Rigorously adhering to GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and specific client standards, our products guarantee top-notch quality and reliability. Our offerings cater to diverse sectors including petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive industries. Nestled in Changsha, Hunan, our state-of-the-art factory spans 4000 square meters and is ISO9001:2015 and ISO14001:2015 certified. Boasting cutting-edge technology and a team of highly skilled technicians, we utilize advanced testing instruments such as carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure superior product quality. Our unwavering commitment to excellence, competitive pricing, punctual delivery, and exceptional after-sales service has cemented a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Discover unparalleled expertise and quality with Changsha XinKang Advanced Materials Co., Ltd.
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