High Purity Al Aluminum Sputtering Target for PVD Coating

Product Details
Customization: Available
Type: Metal Target
Shape: Sheet

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Management System Certification
ISO 9001, ISO 14001
  • High Purity Al Aluminum Sputtering Target for PVD Coating
  • High Purity Al Aluminum Sputtering Target for PVD Coating
  • High Purity Al Aluminum Sputtering Target for PVD Coating
  • High Purity Al Aluminum Sputtering Target for PVD Coating
  • High Purity Al Aluminum Sputtering Target for PVD Coating
  • High Purity Al Aluminum Sputtering Target for PVD Coating
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Basic Info.

Model NO.
XK-Al
Certification
TUV, ISO, CE
Purity
99.9%-99.999%
Size
Customized
MOQ
1 PC
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Air
Delivery
5-10 Days
Transport Package
Vacuum Sealed
Specification
customized
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

                            Thin film coating materials aluminum/Al sputtering target 
  
Product:  aluminum/Al sputtering target
Purity:   99.9%-99.999%
Size:   customized
Shape:   Planar and rotary
Technology:   Vacuum Melting
Application:   infrared detectors and magnetic data storage field,etc
Packing:   Vacumm sealed, wooden case
     
High Purity Al Aluminum Sputtering Target for PVD Coating
High Purity Al Aluminum Sputtering Target for PVD CoatingHigh Purity Al Aluminum Sputtering Target for PVD Coating
High Purity Al Aluminum Sputtering Target for PVD CoatingHigh Purity Al Aluminum Sputtering Target for PVD CoatingHigh Purity Al Aluminum Sputtering Target for PVD Coating
High Purity Al Aluminum Sputtering Target for PVD CoatingHigh Purity Al Aluminum Sputtering Target for PVD CoatingHigh Purity Al Aluminum Sputtering Target for PVD Coating

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