High Purity Mno2 Sputtering Target for Thin-Film Deposition

• Type: Ceramic Target
• Shape: Round
• Certification: TUV, ISO, CE
• Purity: 99.99%
• Size: Customized
• MOQ: 1 PC
• Model NO.: XK-MnO2
• Free Sample: Accept
• Packing: Wooden Case
• Certificate: Provide for Each Target
• Transport: by Express, Air, Sea
• Delivery: 5-10 Days
• Material: Mno2
• Application: PVD Coating
• Product: Mno2 Sputtering Target
• Transport Package: Wooden Case Outside
• Specification: customized
• Origin: China
• HS Code: 8486909900
• Production Capacity: 1000 PCS/Year

Product Description

Product Name: MnO2 Sputtering Target

 

Category: Target Material

 

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Description: Our MnO2 Sputtering Target is a high-quality product designed for PVD and PLD applications. Made from premium materials, this target ensures excellent performance and durability. It is ideal for magnetron sputtering and PVD coating processes, providing a uniform and precise deposition of MnO2. As a leading manufacturer and supplier in the industry, we guarantee the reliability and consistency of our MnO2 Sputtering Target. Enhance your thin film deposition processes with our top-notch target material.