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High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition

High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition pictures & photos
High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition pictures & photos
High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition pictures & photos
High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition pictures & photos
High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition pictures & photos
High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition pictures & photos
  • High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition
  • High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition
  • High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition
  • High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition
  • High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition
  • High-Purity 99.5% Aluminum Nitride Sputtering Target for Thin Film Deposition
Reference FOB Price
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US $100.00-1,000.00 / Piece | 1 Piece (Min. Order)
Type: Ceramic Target
Shape: Round
Certification: TUV, ISO, CE
Dimension: Customized
Purity: 99.5%
Application: PVD Coating
Customization:
Available
| Customized Request
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