• Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
  • Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
  • Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
  • Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
  • Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
  • Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes

Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes

Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%
Type: Ceramic Plate
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Customization:
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Overview

Basic Info.

Model NO.
XK-ZnO
Materials
ZnO
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3812100000
Production Capacity
10000PCS/Month

Product Description

Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
Product Description

XinKang Factory proudly offers premier, top-ranking 99.99% pure Zinc Oxide Sputtering Targets. These ZnO ceramic magnetron targets are ideal for high-quality coating applications, promising unmatched performance.
Name Zinc Oxide Ceramic Sputtering Target / ZnO ceramic targets
Material Zinc Oxide ZnO Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color Yellow Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Zn Density 7.133g/cm3
Zn Melting Point 419°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:Xinkang specializes in producing and supplying a comprehensive range of ceramic sputtering targets and compound targets. Our offerings include oxide, carbide, fluoride, and sulfide sputtering targets.targets. Utilizing advanced production technology, particularly hot press sintering, we ensure top-notch quality at every stage.From the meticulous selection of raw materials to the precise control of temperature, pressure, and duration of hot press sintering, we rigorously adhere to specific production processes. This guarantees that our ceramic sputtering targets exhibit high purity, high density, and uniform surface color, free from spots and cracks. End users can achieve consistent erosion rates and produce high-purity, homogeneous thin films during PVD processes.erosion rates and high-purity, homogeneous thin films during PVD processes.
Zinc Oxide Sputtering Target;
Purity: 99.95%;
Production Method: Cold Press Sintering;
Available Dimensions:
Circular Target: Diameter = 3 mm;
Rectangular Target: Length = 3 mm;
Rotary Target: L 4000 x Wall Thickness 15mm;
Minimum Order Quantity: 1 piece;
Type of Bonding: Indium, Elastomer;
Application Fields: Thin-film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target
NiO Sputtering Target
MoO3 Sputtering Target
WO3 Sputtering Target
Introducing the premium LiFePO4 Sputtering Target, engineered for unparalleled performance in your thin-film deposition processes.
Discover the exceptional ZnS Sputtering Target, meticulously crafted for superior results in magnetron sputtering applications.
Experience the high-efficiency Bi2Te3 Sputtering Target, designed to meet the demanding requirements of advanced thin-film technologies.
Unveil the cutting-edge Ga2O3 Sputtering Target, offering remarkable purity and precision for optimal thin-film deposition.
Explore the innovative In2O3 Sputtering Target, tailored to deliver outstanding performance in magnetron sputtering systems.
Benefit from the advanced Ta2O5 Sputtering Target, providing excellent consistency and high-purity for your deposition needs.
Enhance your production with the Nb2O5 Sputtering Target, ensuring top-tier results for high-performance thin-film applications.
Product Parameters

Hafnium Oxide Sputtering Target
/ HfO2 Ceramic Targets Certificate of Analysis (COA)
Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
Application:
1. Enhance and sustain the surface properties of various materials, including improved hardness, wear resistance, and corrosion resistance, ensuring superior performance and longevity.
2. Essential in the fabrication and enhancement of both new and existing materials' performance, widely utilized in solar cells, LEDs, and flat panel displays for advanced technological applications.
3. Integral in the production of vital electronic components such as transistors and integrated circuits, pivotal in modern electronics and innovations.
4. Crucial in the development of superconductors, optical films, sensors, and other high-tech materials, pushing the boundaries of scientific advancement.

Related Products:
Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom SizesZinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha Xinkang Advanced Materials Co., Ltd. stands as a leading innovator in the realm of high-quality metal materials. Our core expertise encompasses the meticulous research, development, production, processing, sales, and service of a diverse array of metal products. Our extensive catalog includes metal elements, alloys, sputtering targets (metal, alloy, ceramic), evaporation materials, metal powders, alloy powders, and tailor-made metal solutions. We pride ourselves on adhering to the highest standards—including GB/T, ASTM/B, ASME SB, AMS, DIN, JIS—while also accommodating custom specifications to meet the unique demands of our clients. Our superior products serve a broad spectrum of industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Strategically located in Changsha, Hunan, our state-of-the-art 4000 square meter factory is fortified with ISO9001:2015 and ISO14001:2015 certifications. Leveraging cutting-edge technology and a highly skilled team, we utilize advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to guarantee exceptional product quality. Our unwavering commitment to excellence, competitive pricing, prompt delivery, and outstanding after-sales service have garnered us a loyal clientele across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Experience the pinnacle of metal materials and unparalleled service with Changsha Xinkang Advanced Materials Co., Ltd.
Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
Certifications

Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
Factory and Equippments

Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
Packaging & Shipping

Zinc Oxide Ceramic Target for Magnetron Sputtering, High Purity ZnO, Custom Sizes
FAQ

1. Are you a trading company or a manufacturer?

Xinkang: We proudly stand as a distinguished manufacturer with over a decade of unparalleled expertise in the advanced materials industry.

2. How long is your delivery time?

Xinkang: For standard-sized items or samples, our shipment will be dispatched within 3-5 days. For bulk orders, you can expect a swift delivery time of approximately 15 days.

3. Do you have a Minimum Order Quantity (MOQ)?

Xinkang: Absolutely not! We maintain flexibility with no MOQ, readily accommodating sample orders to cater to your needs.

4. What are your payment methods?

Xinkang: We offer a variety of convenient payment methods, including T/T in advance, PayPal, Western Union, and more.

Feel free to contact us anytime! Your inquiries are always welcome.

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