• High Purity Tantalum Oxide Sputtering Target
  • High Purity Tantalum Oxide Sputtering Target
  • High Purity Tantalum Oxide Sputtering Target
  • High Purity Tantalum Oxide Sputtering Target
  • High Purity Tantalum Oxide Sputtering Target
  • High Purity Tantalum Oxide Sputtering Target

High Purity Tantalum Oxide Sputtering Target

Application: Aerospace, Architectural, Ceramic Decorations, Electronics, Home Use, Medical, Refractory, Semiconductor, Optical Caoting
Material Composition: Ta2o5
Speciality: High Insulation, High Strength, Temperature Resistant
Type: Ta2o5
Packaging: 1PC Vacuum Forming
Purity: 99.99%Min
Customization:
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Overview

Basic Info.

Model NO.
XK-Ta2O5 02
Size
Customized
Delivery
7-15days
Certificate
ISO9001:2015
MOQ
1PC
Transport Package
Vacuum Inside, Carton or Wooden Case Outside
Specification
D50.8mm D101.6mm support
Trademark
No
Origin
China
Production Capacity
10000PCS/Month

Product Description

High Purity Tantalum Oxide Sputtering Target
Product Description

Leading Innovators in Sputtering Targets and Evaporation Materials

Product Name Ta2O5 Ceramic Sputtering Target 
Available Purity 99.99%
Available shape Rectangle, Round, Rotary, Pellets, Ingots,as per your request
Size D50.8mm  D101.6mm support customized
Technolgy Sintering
Type of Bonding Indium, Elastomer
COA Available for COA( Certificate of Analysis), please contact sales
Quotation We are factory and can smelt according to customer's alloy ratio. For details, please contact the sales manager(The title price is for reference only, please inquiry sales for specific quotation)
Application Solar, Optical,Process,Decoration,LED,Semi,
Related products ITO, AGZO,,Metal Alloy sputtering targets, Metal targets

Exquisite Description:

High Purity: Our Tantalum Pentoxide (Ta2O5) sputtering targets boast exceptional purity levels, ensuring unparalleled quality and stability in thin film deposition. Density Uniformity: Experience consistent density uniformity within the target material, paramount for the stability of your thin film deposition processes and the pristine quality of film formation. Chemical Stability: Our targets exhibit superior chemical stability, mitigating the risk of unexpected chemical reactions or degradation during the PVD process. Excellent Electrical Conductivity: With outstanding electrical conductivity, our Tantalum Pentoxide sputtering targets guarantee optimal electron transport properties during deposition.Principal Applications:

Optical Thin Film Deposition : Harness the potential of Ta2O5 sputtering targets in the realm of optical thin film deposition to produce cutting-edge thin films with specialized optical properties, including anti-reflection coatings and optical filters. Electronic Device Fabrication : Utilize Ta2O5 sputtering targets in electronic device fabrication to deposit thin films essential for electrodes, dielectric layers, and other critical components, ensuring innovation and performance. Surface Coatings : Employ Ta2O5 sputtering targets in surface coatings to significantly enhance surface hardness, wear resistance, and corrosion resistance, thereby extending the lifespan and durability of substrates. Research and Development : In the avant-garde fields of scientific research and materials development, Ta2O5 sputtering targets are indispensable for crafting thin films of novel functional materials, fostering performance testing and pioneering application exploration.
High Purity Tantalum Oxide Sputtering Target
Related Products

High Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering Target
Inspection Equipment

High Purity Tantalum Oxide Sputtering Target
Factory Equipment and Process

• Advanced Vacuum Furnace: Unmatched Precision in Controlled Atmospheres
• High-Precision Sintering Furnace: Superior Uniformity and Performance
• Robust Forging Machine: Strength and Durability at Its Best
• Efficient Rolling Machine: Consistent Quality and Efficiency
• Versatile Lathe: Precision Engineering for Diverse Applications
• Precision Grinder: Exceptional Surface Finish and Accuracy
• Innovative CNC Machining: Cutting-Edge Accuracy and Flexibility
• High-Accuracy Water Cutting: Precision and Versatility Combined
• Precision Wire Cutting: Perfect Accuracy for Intricate Designs
• Reliable Muffle Furnace: Consistent Heat for Optimal Processing
• Advanced Rotary Forging: Enhanced Strength and Uniformity
• Powerful Hydraulic Press: Ultimate Force and Precision
• Accurate Leveling Machine: Perfect Flatness and Stability
• High-Efficiency Punching Machine: Speed and Precision in One
• Specialized Polishing Machine: Superior Finish and Quality
• Versatile Abrasive Belt Machine: Ultimate Flexibility and Efficiency
• Ultrasonic Cleaning Machine: Unparalleled Cleanliness and Care
• Comprehensive Machine Solutions: From Concept to Completion
High Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering Target
Product Application:

High Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering Target
Company Information:

High Purity Tantalum Oxide Sputtering Target
Our expansive factory covers over 4,000 square meters and proudly holds ISO 9001:2015 and ISO 14001:2015 certifications, underscoring our unwavering commitment to quality management and environmental stewardship. Equipped with cutting-edge technology and a highly skilled technical team, we guarantee unparalleled product excellence. Every item undergoes meticulous testing, utilizing carbon sulfur instruments, spectrometers, flaw detectors, cupping machines, stiffness testers, and more. Our dedicated technicians and expert workforce leverage advanced technology to deliver top-tier products and services. Our offerings are globally cherished, reaching the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya, thanks to our steadfast dedication to superior quality, competitive pricing, prompt delivery, and exceptional after-sales support.
Regardless of order volume or size, our steadfast commitment is to meet your every requirement—a promise we've upheld for years.
High Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering Target

High Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering Target
Standard Export Packaging: Interior vacuum-sealed; exterior protected by export carton or wooden case.
We offer a variety of flexible shipping options, including FedEx, DHL, UPS, and TNT express.
For shipments with a gross weight ≤100KG, we ensure express shipping. For larger shipments ≥100KG, we will discuss the most efficient shipping method with you.
High Purity Tantalum Oxide Sputtering TargetHigh Purity Tantalum Oxide Sputtering Target

1. Are you a trading company or manufacturer?

XinKang: We are a seasoned manufacturer with over a decade of expertise in this field.

2. How long is your delivery time?

XinKang: For regular sizes or samples, shipment is prompt within 3-5 days. Batch quantities are dispatched in 15 days.

3. Do you have a minimum order quantity (MOQ)?

XinKang: No, we support sample orders without any MOQ.

4. What is your payment method?

XinKang: We accept T/T in advance, PayPal, Western Union, and other methods.

We warmly welcome you to contact us at any time!

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Diamond Member Since 2018

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Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001