• 99.99% Pure Sio2 Ceramic Target for Thin Film Coating
  • 99.99% Pure Sio2 Ceramic Target for Thin Film Coating
  • 99.99% Pure Sio2 Ceramic Target for Thin Film Coating
  • 99.99% Pure Sio2 Ceramic Target for Thin Film Coating
  • 99.99% Pure Sio2 Ceramic Target for Thin Film Coating
  • 99.99% Pure Sio2 Ceramic Target for Thin Film Coating

99.99% Pure Sio2 Ceramic Target for Thin Film Coating

Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%
Type: Ceramic Plate
Size: 1inch 2inch 3inch or as Your Request
OEM: Support
MOQ: 1PC
Customization:
Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-SiO2
Materials
Silicon Dioxide
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3824999999
Production Capacity
10000PCS/Month

Product Description

99.99% Pure Sio2 Ceramic Target for Thin Film Coating
Product Description

XinKang Factory 99.995% Purity SiO2 Planar Sputtering Target Silicon Dioxide Ceramic target for Coating
Name Silicon Dioxide Ceramic Sputtering Target / SiO2 Ceramic targets
Material Silicon Dioxide SiO2 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.2g/cm3
Melting Point 1723°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Silica, also known as silicon dioxide, has the chemical formula SiO2.In nature, silica exists in two forms: crystalline and amorphous.SiO2 boasts a remarkably high melting point of 1723°C and a boiling point of 2230°C.The refractive index of SiO2 is approximately 1.6.

Application Fields:
Utilized as analytical reagents, fluorophores, and photoconductor materials. Essential in the production of dyes, coatings, pigments, glass, and cured oil. Additionally, SiO2 finds application in various optical filters and laser window coatings.
Thin-film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating Industry
Silica is a key raw material for manufacturing glass, quartz glass, water glass, and optical fiber.It is a critical component in the electronics industry and optical instruments.Moreover, it is used in the creation of handicrafts and refractory materials, playing a significant role in scientific research.
Applications of silica include flat glass, glass products, foundry sand, glass fiber, ceramic glaze, anti-rust sand blasting,filter sand, flux, refractory materials, and the manufacturing of lightweight bubble concrete (Autoclaved Lightweight Concrete).It is instrumental in producing essential components, optical instruments, and handicrafts for the electronics industry.Silica is a vital raw material for crafting optical fibers. It is employed in making quartz glass and often used for high-temperature chemical instruments.Quartz sand is frequently utilized as a raw material for glass and building materials.

Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
ZnO Sputtering Target
TiO2 Sputtering Target
MnO2 Sputtering Target
TiN Sputtering Target
Si3N4 Sputtering Target
Al2O3 Sputtering Target
SiC Sputtering Target
Co2O3 Sputtering Target
AlN Sputtering Target
ITO Sputtering Target
VO2 Sputtering Target
SiO2 Sputtering Target
Fe2O3 Sputtering Target
MgO Sputtering Target
SnO2 Sputtering Target
CuO Sputtering Target - High Purity for Superior Thin Film Deposition
Premium NiO Sputtering Target - Designed for Superior Performance and Durability
High-Quality MoO3 Sputtering Target - Engineered for Precision and Reliability
Exceptional WO3 Sputtering Target - Unmatched Consistency and Excellence
Top-Tier LiFePO4 Sputtering Target - Reliable, Efficient, and High Performance
Advanced ZnS Sputtering Target - Optimal for High-Performance Thin Film Applications
Superior Bi2Te3 Sputtering Target - Ideal for Cutting-Edge Technological Innovations
Premium Ga2O3 Sputtering Target - Engineered for Excellence and Precision
High-Grade In2O3 Sputtering Target - Consistent, Reliable, and High Quality
Top-Quality Ta2O5 Sputtering Target - Perfect for Precision Thin Film Applications
Exceptional Nb2O5 Sputtering Target - Designed for Durability, Performance, and Excellence
Product Parameters


/ SiO2 Ceramic Targets - Prestigious Certificate of Analysis (COA)
99.99% Pure Sio2 Ceramic Target for Thin Film Coating
Innovative Applications:
1. Enhance and preserve the surface attributes of materials, significantly elevating hardness, wear resistance, corrosion resistance, and more.
2. Crucial for the creation of cutting-edge materials and the enhancement of existing ones, widely applicable in solar cells, LEDs, flat panel displays, and beyond.
3. Indispensable in the fabrication of electronic components, including transistors and integrated circuits.
4. Vital for the avant-garde development of superconductors, optical films, sensors, and a diverse array of advanced materials.

Exclusive Related Products:
99.99% Pure Sio2 Ceramic Target for Thin Film Coating99.99% Pure Sio2 Ceramic Target for Thin Film Coating
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a leading factory dedicated to the pioneering research, innovative development, precision production, meticulous processing, global sales, and comprehensive service of premium metal materials. Our diverse product portfolio encompasses high-purity metal elements, sophisticated alloys, precision metal sputtering targets, versatile alloy targets, advanced ceramic targets, specialized evaporation materials, high-grade metal powders, and customized alloy powders, catering to a variety of bespoke metal requirements. Upholding the rigorous standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, among others, we ensure unparalleled quality and reliability in all our products. These superior materials serve critical applications across sectors such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive industries. Our state-of-the-art factory, sprawling over 4000 square meters in Changsha, Hunan, boasts ISO9001:2015 and ISO14001:2015 certifications, underscoring our commitment to quality management and environmental sustainability. Outfitted with the latest in technological advancements and staffed by an expert team of technicians, we employ advanced testing equipment, including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers, ensuring each product meets the highest standards of excellence. Our unwavering dedication to quality, competitive pricing, punctual delivery, and outstanding after-sales service has cultivated a devoted clientele from the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Partner with us to experience unparalleled excellence in metal materials and services.
99.99% Pure Sio2 Ceramic Target for Thin Film Coating
Certifications

99.99% Pure Sio2 Ceramic Target for Thin Film Coating
Factory and Equippments

99.99% Pure Sio2 Ceramic Target for Thin Film Coating
Packaging & Shipping

99.99% Pure Sio2 Ceramic Target for Thin Film Coating
FAQ

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now

You Might Also Like

Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001