• 99.99% & 99.999% Aluminium Electrode for PVD Sputtering
  • 99.99% & 99.999% Aluminium Electrode for PVD Sputtering
  • 99.99% & 99.999% Aluminium Electrode for PVD Sputtering
  • 99.99% & 99.999% Aluminium Electrode for PVD Sputtering
  • 99.99% & 99.999% Aluminium Electrode for PVD Sputtering
  • 99.99% & 99.999% Aluminium Electrode for PVD Sputtering

99.99% & 99.999% Aluminium Electrode for PVD Sputtering

Type: Metal Target
Shape: Rectangle
Certification: TUV, ISO, CE
Purity: 99.9%-99.9999%
Material: Aluminum
Size: Customized
Customization:
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Suppliers with verified business licenses

Manufacturer/Factory

Basic Info.

Model NO.
XK-Al
Application
Glass/Metal/Plastic/Ceramic Coating
MOQ
1 PC
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Express
Delivery
5-10 Days
Transport Package
Wooden Case
Specification
any size
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

Aluminum/Al sputtering target features:

Chemical Composition: pure Aluminum

Available Purity: 3N-6N

Production Technology: EB melting

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  

Aluminum Sputtering Targets are produced by melting technology, usually applled for optical coating and semiconductor field. With up to 6N purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

99.99% &amp; 99.999% Aluminium Electrode for PVD Sputtering

COMPANY PROFILE:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

99.99% &amp; 99.999% Aluminium Electrode for PVD Sputtering99.99% &amp; 99.999% Aluminium Electrode for PVD Sputtering

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer       
 99.99% &amp; 99.999% Aluminium Electrode for PVD Sputtering                                     
 OUR ADVANTAGE


1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm                                                   
99.99% &amp; 99.999% Aluminium Electrode for PVD Sputtering

PACKING & DELIVERY
 
Packaging Detail:
Inside: drying agent and vacuum sealed to prevent oxidization
Outside: wooden case to avoid damage during transportation

 
Delivery Detail: Within 3-15 working days .
DHL, FedEx, UPS door to door service, 5-7 days from China to your country.
 
99.99% &amp; 99.999% Aluminium Electrode for PVD Sputtering
OUR CERTIFICATE

99.99% &amp; 99.999% Aluminium Electrode for PVD Sputtering


 

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Diamond Member Since 2018

Suppliers with verified business licenses

Manufacturer/Factory
Management System Certification
ISO 9001, ISO 14001