High Purity Silicon Dioxide Ceramic Target for Sputtering Processes

Product Details
Customization: Available
Application: Architectural, Ceramic Decorations, Electronics, Home Use, Medical, PVD Film Coating
Purity: 99.90%

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  • High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
  • High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
  • High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
  • High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
  • High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
  • High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Certifications
  • Factory and Equippments
  • Packaging & Shipping
  • FAQ
Overview

Basic Info.

Model NO.
XK-SiO2
Materials
Silicon Dioxide
Delivery Time
7-21days
Transport Package
Vacuum Blister
Specification
D50.8mm
Trademark
XinKang
Origin
China
HS Code
3824999999
Production Capacity
10000PCS/Month

Product Description

High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
Product Description

XinKang Factory 99.995% Purity SiO2 Planar Sputtering Target - Silicon Dioxide Ceramic Target for Coating
Name Silicon Dioxide Ceramic Sputtering Target / SiO2 Ceramic targets
Material Silicon Dioxide SiO2 Ceramic Materials
Purity 99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.
Size D3x3mm, 2inch,3inch,Or As Request
Color White Color
Shape Pellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.
Surface Polished Surface
Density 2.2g/cm3
Melting Point 1723°C
Application PVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related Item Al,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
Note Support customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Description:

Silica, also known as silicon dioxide, is represented by the chemical formula SiO2.Silica exists in nature in two forms: crystalline silica and amorphous silica.SiO2 boasts a high melting point of 1723°C and an equally impressive boiling point of 2230°C.It has a refractive index of approximately 1.6.

Application Fields:
Silicon dioxide is used as analytical reagents, fluorophores, and photoconductive materials. It is also integral in the manufacturing of dyes, coatings, pigments, glass, and cured oil. Furthermore, it is utilized in various optical filters and laser window coatings.
Key industries: Thin-film Photovoltaic, LOW-E Glass, Decorative & Tools Coating.
Silica serves as a foundational material for producing glass, quartz glass, water glass, optical fibers,as well as essential components in the electronic industry, and optical instruments.Additionally, it is used in the creation of handicrafts and refractory materials, making it crucial for scientific research.
Applications of silica include: flat glass, glass products, foundry sand, glass fiber, ceramic glaze, anti-rust sandblasting,filter sand, flux, refractory materials, and the production of lightweight bubble concrete, such as Autoclaved Lightweight Concrete (ALC).It is utilized in the manufacturing of vital electronic components, optical instruments, and artistic handicrafts.Silica is a key raw material for producing optical fibers and quartz glass, often used in high-temperature chemical instruments.Quartz sand, a common form of silica, is widely used as a raw material in glass production and as building materials.

Other Related Targets: Aluminum Oxide (Al2O3) Sputtering Target
Aluminum Zinc Oxide (AZO) Sputtering Target
Indium Oxide (In2O3) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
Tantalum Oxide (Ta2O5) Sputtering Target
Niobium Oxide (Nb2O5) Sputtering Target
Related Sputtering Materials
Zinc Oxide (ZnO) Sputtering Target
Titanium Dioxide (TiO2) Sputtering Target
Manganese Dioxide (MnO2) Sputtering Target
Titanium Nitride (TiN) Sputtering Target
Silicon Nitride (Si3N4) Sputtering Target
Aluminum Oxide (Al2O3) Sputtering Target
Silicon Carbide (SiC) Sputtering Target
Cobalt Oxide (Co2O3) Sputtering Target
Aluminum Nitride (AlN) Sputtering Target
Indium Tin Oxide (ITO) Sputtering Target
Vanadium Oxide (VO2) Sputtering Target
Silicon Dioxide (SiO2) Sputtering Target
Iron Oxide (Fe2O3) Sputtering Target
Magnesium Oxide (MgO) Sputtering Target
Tin Oxide (SnO2) Sputtering Target
CuO Sputtering Target - Ideal for High-Performance Coating
Premium NiO Sputtering Target - Crafted for Unparalleled Performance
High-Quality MoO3 Sputtering Target - Precision-Engineered for Excellence
Exceptional WO3 Sputtering Target - Consistency You Can Trust
Top-Tier LiFePO4 Sputtering Target - Dependable and Efficient
Advanced ZnS Sputtering Target - Optimized for High-Performance Applications
Superior Bi2Te3 Sputtering Target - Essential for Cutting-Edge Technologies
Premium Ga2O3 Sputtering Target - Excellence in Every Layer
High-Grade In2O3 Sputtering Target - Reliability and Consistency Assured
Top-Quality Ta2O5 Sputtering Target - Precision Perfected
Exceptional Nb2O5 Sputtering Target - Crafted for Durability and Peak Performance
Product Parameters


/ Thorough SiO2 Ceramic Targets Certificate of Analysis (COA)
High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
Application:
1. Enhance and preserve the surface attributes of materials, significantly elevating hardness, wear resistance, and corrosion resistance, among other qualities.
2. Indispensable for the creation of cutting-edge materials and the enhancement of existing ones, with applications spanning solar cells, LEDs, flat panel displays, and more.
3. Fundamental in the fabrication of electronic components such as transistors and integrated circuits, ensuring superior performance.
4. Critical for the development of superconductors, optical films, sensors, and a myriad of advanced materials, driving technological innovation.

Related Products:
High Purity Silicon Dioxide Ceramic Target for Sputtering ProcessesHigh Purity Silicon Dioxide Ceramic Target for Sputtering Processes
Ceramic Targets
Oxide AI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.
Sulfide CuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.
Nitride AIN, TIN, Si3N4, NbN, TaN, BN, etc.
Carbide B4C, SiC, WC, TIC, TaC, etc.
Fluoride YbF3, MgF2, CaF2, LiF, AIF3, etc.
Others LaB6, MgB2, Sb2Te3, etc.
   
Alloy Tagets
Nickel Based NiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etc
Iron Based FeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etc
Cobalt Based CoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etc
Copper Based CuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etc
Aluminum Based AlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etc
Other Alloy WTi, ZnAl, ZnSn
   
Metal Targets
High purity metal Ni, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;
Rare earth metal Sc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etc
Refractory metal Hf, Zr, Ta, Nb, w, Mo,etc
Precious metal Ir, Ru, Pd, Os, etc

Company Profile

Factory:
Founded in 2014, Changsha Xinkang Advanced Materials Co., Ltd. stands as a premier powerhouse in the realm of high-quality metal materials. We excel in research, development, production, processing, sales, and service of an array of metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and custom metal products. Adhering to the stringent standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and tailored client specifications, we guarantee unmatched quality across all offerings. Our versatile products serve pivotal roles in diverse industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Nestled in Changsha, Hunan, our state-of-the-art facility spans 4000 square meters and boasts certifications in ISO9001:2015 and ISO14001:2015. With cutting-edge technology and a team of highly skilled technicians, we utilize advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to assure superior product quality. Our unwavering commitment to excellence, competitive pricing, timely delivery, and unparalleled after-sales service have cultivated a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Experience the pinnacle of metal materials and services with Changsha Xinkang Advanced Materials Co., Ltd.
High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
Certifications

High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
Factory and Equippments

High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
Packaging & Shipping

High Purity Silicon Dioxide Ceramic Target for Sputtering Processes
FAQ

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