99.5% Pure Tantalum Nitride Deposition Material Tan Target for Thin Film Coating

• Customization: Available
• Type: Ceramic Target
• Shape: Round
• Certification: TUV, ISO, CE
• Dimension: Customized
• Purity: 99.5%
• Application: PVD Coating
• Chemical Composition: 99.5% Tan
• MOQ: 1 PC
• Packing: Vacuum Sealed
• Certificated: ISO 9001, 14001
• Delivery: 7-15 Days
• Surface: Smooth
• Material: Tantalum Nitride
• Transport Package: Vacuum Sealed Package
• Specification: customized
• Trademark: XINKANG
• Origin: Changsha, China
• HS Code: 8486909900
• Production Capacity: 5000pieces/Year

Product Description

Product Name: High Purity Tantalum Nitride Sputtering Target TaN

Category: Target Material

Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor deposition

Description: Elevate your cutting-edge thin film technology with our High Purity Tantalum Nitride Sputtering Target. Expertly crafted for the semiconductor industry, this top-tier ceramic target material excels in PVD coating applications. Boasting a high purity composition, our tantalum nitride target guarantees exceptional performance in vacuum deposition processes. Achieve precise, uniform thin film deposition effortlessly with the superior quality of this sputtering target. Boost the efficiency and effectiveness of your PVD coating operations with our tantalum nitride sputtering target. Invest in unparalleled excellence for all your thin film technology requirements.